Electro-Optical Device, Manufacturing Method for Electro-Optical Device, and Electronic Apparatus

• US 20160033760A1
• Filed: 07/22/2015
• Published: 02/04/2016
• Est. Priority Date: 08/01/2014
• Status: Active Grant

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: SUGIMOTO, Yohei
• Granted Patent: US 10,444,493 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: C30B 25/183 being provided with a buffer layer, e.g. a lattice matching layer
• CPC Class Codes: C30B 25/186 being specially pre-treated by, e.g. chemical or physical means
• CPC Class Codes: C30B 29/02 Elements
• CPC Class Codes: C30B 29/16 Oxides
• CPC Class Codes: C30B 29/38 Nitrides
• CPC Class Codes: C30B 29/68 Crystals with laminate structure, e.g. "superlattices"
• CPC Class Codes: G02B 1/14 Protective coatings, e.g. hard coatings
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means
• CPC Class Codes: G02B 5/0858 the reflecting layers comprising a single metallic layer with one or more dielectric layers

Abstract

An electro-optical device includes a substrate, a mirror support pillar extending in a direction in which the pillar intersects with a surface of the substrate, and a mirror that is so disposed as to be distanced from the substrate and to be capable of being displaced with respect to the mirror support pillar. The mirror has a reflective metal film, and a reflection enhancing lamination film that covers a portion including a surface and a side surface of the reflective metal film.

Claims

1. An electro-optical device comprising:

a substrate;

a mirror that includes a reflective metal film and is disposed above one surface of the substrate so as to be distanced from the substrate;

a support section that is disposed between the substrate and the mirror, the support section has a portion connected to part of the mirror to support the mirror; and

a reflection enhancing lamination film that is disposed so as to cover at least a part of a surface of the mirror on an opposite side to the substrate and a side surface of the mirror.

2. The electro-optical device according to claim 1,

wherein the reflection enhancing lamination film includes a first oxide film and a second oxide film, the second oxide film having a larger refractive index than the first oxide film and disposed on a side of the first oxide film opposite to the reflective metal film.

3. The electro-optical device according to claim 2,

wherein the first oxide film is silicon oxide, and

the second oxide film is silicon nitride.

4. The electro-optical device according to claim 1,

wherein the reflective metal film is made of aluminum.

5. The electro-optical device according to claim 1,

wherein the mirror includes, between the reflective metal film and the substrate, a seed lamination film for aligning crystal plane orientations.

6. The electro-optical device according to claim 5,

wherein the seed lamination film is a lamination film including a titanium nitride layer which is disposed between the reflective metal film and the substrate, and a titanium layer which is disposed between the titanium nitride layer and the substrate.

7. The electro-optical device according to claim 6,

wherein the seed lamination film includes a silicon oxide layer that contains boron and phosphorus and is disposed between the titanium layer and the substrate.

11. An electronic apparatus comprising:

the electro-optical device according to claim 1.

8. A manufacturing method for an electro-optical device comprising:

forming a sacrifice layer on one surface of a substrate;

forming a seed lamination film for aligning crystal plane orientations on the sacrifice layer;

forming a reflective metal film on the seed lamination film;

forming a reflection enhancing lamination film so as to cover at least a part of a surface of the reflective metal film on an opposite side to the substrate, a side surface of the reflective metal film, and a side surface of the seed lamination film; and

forming a mirror by removing the sacrifice layer.

9. The manufacturing method for the electro-optical device according to claim 8,

wherein the reflective metal film is made of aluminum, and

the forming of the reflection enhancing lamination film includes forming a silicon oxide layer on the aluminum layer and forming a silicon nitride layer on the silicon oxide layer.

10. The manufacturing method for the electro-optical device according to claim 8,

wherein the forming of the seed lamination film includes forming a silicon oxide layer containing boron and phosphorus on the sacrifice layer, forming a titanium layer on the silicon oxide layer containing boron and phosphorus, and forming a titanium nitride layer on the titanium layer.