LOW-K DIELECTRIC FILM FORMATION

• US 20160042943A1
• Filed: 09/05/2014
• Published: 02/11/2016
• Est. Priority Date: 08/07/2014
• Status: Abandoned Application

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Antonelli, George Andrew, Ribaudo, Troy Daniel
• Application Number:
  US14/479,130
• Publication Number:
  US 20160042943A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/32926 Software, data control or modelling
• CPC Class Codes: H01L 21/02126 the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
• CPC Class Codes: H01L 21/02203 the layer being porous
• CPC Class Codes: H01L 21/0234 treatment by exposure to a plasma
• CPC Class Codes: H01L 21/02348 treatment by exposure to UV light
• CPC Class Codes: H01L 21/67115 mainly by radiation

Abstract

Methods and apparatus for fabricating a porous, low-k dielectric film are described. In some implementations, the methods include exposing a precursor film including a porogen within a matrix to a plasma generated from a weak oxidizer. The plasma may also include reducing agent species. In some implementations, the plasma is a downstream plasma. Implementations of the method involve selectively removing regions of isolated, organic porogen co-existing within a silicon-organic matrix by exposure to the plasma while preserving the organic groups bonded to the backbone of the silicon matrix. The methods also result in low damage to the dielectric film. In some implementations, plasma exposure is followed by exposure to ultraviolet (UV) radiation.

Claims

1. A method comprising:

providing a precursor film including a dielectric matrix and a porogen;

exposing the precursor film to a downstream plasma generated from a process gas including a reducing agent and a weak oxidizer to thereby remove porogen and form a porous dielectric film.

2. The method of claim 1, further comprising exposing the porous dielectric film to UV radiation to thereby increase cross-linking.

3. The method of claim 2, wherein exposing the porous dielectric film to UV radiation comprises exposing the porous dielectric film to a first emission spectrum and then exposing the porous dielectric film to a second emission spectrum, wherein the first and second emission spectra are different.

4. The method of claim 1, wherein the plasma is generated by an inductively-coupled plasma generator.

5. The method of claim 1, wherein the weak oxidizer is selected from carbon dioxide, water, methanol, ethanol, isopropyl alcohol, and combinations thereof.

6. The method of claim 1, wherein the reducing agent is selected from molecular hydrogen, ammonia, acetic acid, formic acid, and combinations thereof.

7. The method of claim 1, wherein a weak oxidizer:

reducing agent volumetric flow ratio is 1;

1 or greater.

8. The method of claim 1, wherein a weak oxidizer:

reducing agent volumetric flow ratio is between 1;

1 and 2;

1.

9. The method of claim 1, wherein the reducing agent is molecular hydrogen (H₂) and the weak oxidizer is carbon dioxide (CO₂).

10. The method of claim 1, wherein radical species are predominant in the downstream plasma.

11. The method of claim 1, wherein a power used to generate the downstream plasma is between about 1.0 and 1.8 Watts per cm² of surface area of a substrate on which the precursor film is disposed.

12. An apparatus comprising:

a processing chamber;

a substrate support for holding a substrate in the processing chamber;

a remote plasma source over the substrate support;

a showerhead between the remote plasma source and the substrate support; and

a controller with instructions to perform the following operations;

(a) receiving a substrate including a precursor film including a dielectric matrix and a porogen;

(b) inletting reducing agent and a weak oxidizer gases into the remote plasma source;

(c) applying a power to the remote plasma generator to generate plasma species from the reducing agent and a weak oxidizer gases;

(d) directing remote plasma species including weak oxidizer and reducing agent species through the showerhead; and

(e) exposing a substrate to the remote plasma species in (c).

13. The apparatus of claim 12, wherein the controller comprises instructions to inlet the reducing agent and a weak oxidizer gases into the remote plasma generator at a weak oxidizer:

reducing agent volumetric flow ratio between 1;

1 and 2;

1.

14. The apparatus of claim 12, wherein the controller comprises instructions to apply a power between 1 and 1.8 Watts per cm² of surface area of the substrate.

15. The apparatus of claim 12, further comprising a UV cure chamber.

16. The apparatus of claim 12, wherein the controller comprises instructions to, after (e), expose the substrate to UV radiation.

17. The apparatus of claim 16, wherein the controller comprises instructions to expose the porous dielectric film to a first emission spectrum and then expose the porous dielectric film to a second emission spectrum, wherein the first and second emission spectra are different.