DISPLAY COMPONENT, DISPLAY DEVICE, AND METHOD OF PRODUCING DISPLAY COMPONENT

• US 20160048045A1
• Filed: 12/20/2013
• Published: 02/18/2016
• Est. Priority Date: 12/27/2012
• Status: Abandoned Application

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: IMAI, Akihiro, KANBE, Makoto, FUKAYAMA, Motoaki, UEDA, Ryoh, OBATA, Taichi, TANAKA, Shigeki
• Application Number:
  US14/655,406
• Publication Number:
  US 20160048045A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G02F 1/133345 Insulating layers G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence
• CPC Class Codes: G02F 1/1337 Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
• CPC Class Codes: G02F 1/1343 Electrodes reflective electrodes G02F1/133553
• CPC Class Codes: G02F 1/136227 Through-hole connection of the pixel electrode to the active element through an insulation layer
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: H01L 27/1225 with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
• CPC Class Codes: H01L 27/124 with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits wiring structures per se H01L23/52
• CPC Class Codes: H01L 27/1248 with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
• CPC Class Codes: H01L 27/1255 integrated with passive devices, e.g. auxiliary capacitors
• CPC Class Codes: H01L 27/127 with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement

Abstract

An array board 1311b includes a first conductive film, a second conductive film, an insulator, an alignment film 1311e, and at least two inclined portions 48, 49. The second conductive film is disposed above the first conductive film and at least a portion of the second conductive film overlap the first conductive film in a plan view. The insulator is disposed between the first conductive film and the second conductive film. The insulator includes a contact hole formed at a position overlapping the first conductive film and the second conductive film in a plan view and connects the second conductive film to the first conductive film. The alignment film 1311e is disposed above the second conductive film. The alignment film 1311e includes a portion that overlaps the contact hole in a plan view and a portion that does not overlap the contact hole in a plan view. The inclined portions 48, 49 are formed at an edge of the contact hole in the insulator. The inclined portions 48, 49 have inclined shapes in a cross-sectional view and inclination angles different from each other.

Claims

1-14. -14. (canceled)

15. A display component comprising:

a first conductive film;

a second conductive film disposed above the first conductive film and including a portion overlapping the first conductive film in a plan view;

an insulator held between the first conductive film and the second conductive film and including a contact hole for connecting the second conductive film to the first conductive film, the contact hole being at a position overlapping the first conductive film and the second conductive film in a plan view;

an alignment film disposed above the second conductive film and including a portion overlapping the contact hole in a plan view and a portion not overlapping the contact hole in a plan view; and

at least two inclined portions formed at an edge of the contact hole in the insulator and having inclined shapes in a cross-sectional view with inclination angles different from each other.

16. The display component according to claim 15, wherein the at least two inclined portions are formed such that a difference between the inclination angles thereof is in a range from 10°

to 50°

.

17. The display component according to claim 15, wherein

the insulator is formed such that the contact hole includes a long edge and a short edge in a plan view, and

one of the at least two inclined portions having a smaller inclination angle is formed at the short edge of the contact hole.

18. The display component according to claim 17, wherein the inclined portion having the smaller inclination angle has a dimension along the short edge equal to 8 μ

m or smaller.

19. The display component according to claim 15, wherein

the insulator is formed such that the contact hole has a polygonal shape in a plan view, and

the inclined portion having the smaller inclination angle and the inclined portion having a larger inclination angle of the at least two inclined portions are formed at portions of at least one edge of the contact hole.

20. The display component according to claim 19, wherein

the insulator is formed such that the contact hole has a rectangular shape in a plan view, and

the inclined portion having the smaller inclination angle and the inclined portion having a larger inclination angle of the at least two inclined portions are formed at portions of at least a long edge of the contact hole.

21. The display component according to claim 15, wherein the insulator is formed such that the contact hole has a round shape or an oval shape in a plan view.

22. The display component according to claim 15, wherein the insulator is formed such that the contact hole has an opening area in a range from 10 μ

m² to 150 μ

m².

23. The display component according to claim 15, further comprising:

a third conductive film provided below the first conductive film, at least a portion of the third conductive film overlapping the first conductive film in a plan view; and

a semiconductor film interposed between the third conductive film and the first conductive film, wherein

the first conductive film forms at least a source electrode and a drain electrode,

the third conductive film forms a gate electrode that overlaps at least the source electrode and the drain electrode in a plan view, and

the semiconductor film includes an oxide semiconductor and forma a channel that is connected to the source electrode and the drain electrode.

24. The display component according to claim 23, wherein the oxide semiconductor contains indium (In), gallium (Ga), zinc (Zn), and oxygen (O).

25. The display component according to claim 24, wherein the oxide semiconductor is crystalline.

26. A display device comprising:

the display component according to claim 15;

an opposite board disposed opposite the display component; and

liquid crystals disposed between the display component and the opposite board.

27. A method of producing a display component comprising:

a first film forming process for forming a first conductive film, an insulator, and a second conductive film in this sequence on a substrate, the first film forming process including;

forming a contact hole at a position overlapping the first conductive film and the second conductive film in a plan view for connecting the second conductive film to the first conductive film; and

forming at least two inclined portions at an edge of the contact hole such that the at least two inclined portions have inclined shapes in a cross-sectional view and inclination angles different from each other; and

a second film forming process for forming an alignment film including a portion overlapping the contact hole and a portion not overlapping the contact hole.

28. The method according to claim 27, wherein the first film forming process further includes:

forming at least an organic insulator from photosensitive organic resin material as the insulator;

exposing the organic insulator using a halftone mask including a semitransmissive film or a gray-tone mask including a semitransmissive area with a slit as a photomask; and

forming one of the at least two inclined portions having a smaller inclination angle at the edge of the contact hole with light transmitted through the semitransmissive film of the halftone mask or the semitransmissive area of the gray-tone mask.

29. The method according to claim 27, wherein the first film forming process further includes:

forming at least an organic insulator from photosensitive organic resin material as the insulator;

exposing the organic insulator using a halftone mask including a light blocking film and a semitransmissive film including holes, respectively, as a photomask, the halftone mask including a semitransmissive area in which the hole in the light blocking film overlaps the semitransmissive film in a plan view, the semitransmissive area having a width in a range from 0.5 μ

m to 5 μ

m; and

forming one of the at least two inclined portions having a smaller inclination angle at the edge of the contact hole with light transmitted through the semitransmissive area.

30. The method according to claim 29, wherein

the halftone mask used in the first film forming process is configured according to photosensitivity of the photosensitive organic resin material of the organic insulator,

when the photosensitive organic resin material of the organic insulator is a positive type, the organic insulator is exposed to light using the halftone mask including a transmissive area in which the hole in the light blocking film and the hole in the semitransmissive film overlap each other in a plan view and a distance between the transmissive area and the semitransmissive area is in a range from 0.5 μ

m to 5 μ

m, and

when the photosensitive organic resin material of the organic insulator is a negative type, the organic insulator is exposed to light using the halftone mask including a light blocking area that overlaps the light blocking film in a plan view and a distance between the light blocking area and the semitransmissive area is in a range from 0.5 μ

m to 5 μ

m.

31. The method according to claim 27, wherein the first film forming process includes:

forming at least an organic film from photosensitive organic resin material as the insulator;

exposing the organic insulator using a gray-tone mask as a photomask, the gray-tone mask including a light blocking film and a width of the semitransmissive area including the slit being in a range from 0.5 μ

m to 5 μ

m; and

forming one of the at least two inclined portions having a smaller inclination angle at the edge of the contact hole with light transmitted through the semitransmissive area.

32. The method according to claim 27, further comprising:

forming a third conductive film prior to formation of the first conductive film such that at least a portion of the third conductive film overlaps the first conductive film in a plan view; and

forming a semiconductor film from an oxide semiconductor between the third conductive film and the first conductive film.

33. The method according to claim 32, wherein the oxide semiconductor contains indium (In), gallium (Ga), zinc (Zn), and oxygen (O).

34. The method according to claim 33, wherein the oxide semiconductor is crystalline.