METHOD AND SYSTEM FOR IN SITU FORMATION OF GAS-PHASE COMPOUNDS

• US 20160051964A1
• Filed: 08/21/2014
• Published: 02/25/2016
• Est. Priority Date: 08/21/2014
• Status: Active Grant

• Current Assignee: ASM IP Holding B.V. (ASM International NV)
• Original Assignee: ASM IP Holding B.V. (ASM International NV)
• Inventors: Tolle, John, Hill, Eric, Winkler, Jereld Lee
• Granted Patent: US 9,890,456 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/46 characterised by the method used for heating the substrate C23C16/48, C23C16/50 take precedence
• CPC Class Codes: C23C 16/50 using electric discharges generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/32422 Arrangement for selecting ions or species in the plasma
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32816 Pressure

Abstract

A system and method for providing intermediate reactive species to a reaction chamber are disclosed. The system includes an intermediate reactive species formation chamber fluidly coupled to the reaction chamber to provide intermediate reactive species to the reaction chamber. A pressure control device can be used to control an operating pressure of the intermediate reactive species formation chamber, and a heater can be used to heat the intermediate reactive species formation chamber to a desired temperature.

Claims

1. A gas-phase reactor system comprising:

a reactor comprising a reaction chamber;

an intermediate reactive species formation chamber fluidly coupled to the reaction chamber;

a first gas source fluidly coupled to the intermediate reactive species formation chamber, wherein the first gas source comprises a precursor for intermediate reactive species; and

a pressure control device in fluid communication with the intermediate reactive species formation chamber and interposed between the intermediate reactive species formation chamber and the reaction chamber, wherein the pressure control device controls an operating pressure of the intermediate reactive species formation chamber.

2. The gas-phase reactor system of claim 1, further comprising a remote plasma unit coupled to the intermediate reactive species formation chamber.

3. The gas-phase reactor system of claim 1, further comprising a controller coupled to the pressure control device to control a pressure within the intermediate reactive species formation chamber.

4. The gas-phase reactor system of claim 1, further comprising a flow control unit coupled to the first gas source.

5. The gas-phase reactor system of claim 1, wherein the reactor is selected from the group consisting of a chemical vapor deposition reactor, an atomic layer deposition reactor, an etch reactor, a clean reactor, and a treatment reactor.

6. The gas-phase reactor system of claim 1, wherein the pressure control device is a closed-loop pressure control device.

7. The gas-phase reactor system of claim 1, further comprising an integrated inlet manifold block.

8. The gas-phase reactor system of claim 1, wherein the intermediate reactive species formation chamber comprises a catalyst.

9. The gas-phase reactor system of claim 1, further comprising a heater capable of heating the intermediate reactive species formation chamber to a temperature between about 50°

C. and about 200°

C.

10. The gas-phase reactor system of claim 1, wherein the first gas source comprises one or more or NH₃, NF₃, H₂O,H₂O₂, MMH (mono methyl hydrazine), UDMH (unsymmetrical dimethyl hydrazine), O₂/H₂, N₂/H₂, and H₂S.

11. A method of forming intermediate reactive species for use in a reaction chamber of a reactor, the method comprising the steps of:

providing a first gas to an intermediate reactive species formation chamber;

controlling a pressure within the intermediate reactive species formation chamber; and

forming intermediate reactive species within the intermediate reactive species formation chamber.

12. The method of forming intermediate reactive species for use in a reaction chamber of a reactor of claim 11, further comprising providing a remote plasma unit coupled to the intermediate reactive species formation chamber.

13. The method of forming intermediate reactive species for use in a reaction chamber of a reactor of claim 12, further comprising the steps of:

providing a second gas to the remote plasma unit; and

providing an excited species to the intermediate reactive species formation chamber.

14. The method of forming intermediate reactive species for use in a reaction chamber of a reactor of claim 12, wherein the step of providing a remote plasma unit comprises providing a plasma unit selected from the group consisting of an inductively coupled plasma unit and a microwave unit.

15. The method of forming intermediate reactive species for use in a reaction chamber of a reactor of claim 11, wherein the step of controlling a pressure within the intermediate reactive species formation chamber comprises using a closed-loop pressure controller.

16. The method of forming intermediate reactive species for use in a reaction chamber of a reactor of claim 11, wherein the step of forming intermediate reactive species comprises controlling a valve between the intermediate reactive species formation chamber and the reaction chamber.

17. The method of forming intermediate reactive species for use in a reaction chamber of a reactor of claim 11, further comprising one or more steps selected from the group consisting of:

depositing material onto a surface of a substrate, etching a material on a surface of a substrate, cleaning a surface of a substrate, treating a surface of a substrate, depositing material onto a surface of the reaction chamber, etching material from a surface of the reaction chamber, treating a surface of the reaction chamber, and cleaning a surface of the reaction chamber.

18. A gas-phase reactor system comprising:

a reactor comprising a reaction chamber;

an intermediate reactive species formation chamber fluidly coupled to the reaction chamber;

a first reactant source coupled to the intermediate reactive species formation chamber, wherein the first reactant source is a precursor for intermediate reactive species;

a pressure control device in fluid communication with and interposed between the intermediate reactive species formation chamber and the reaction chamber, wherein the pressure control device controls an operating pressure of the intermediate reactive species formation chamber; and

a heater to heat the intermediate reactive species formation chamber to a temperature of about 50°

C. to about 200°

C.

19. The gas-phase reactor system of claim 18, further comprising a controller coupled to the pressure control device.

20. The gas-phase reactor system of claim 18, wherein the intermediate reactive species formation chamber comprises a catalyst.