TECHNIQUES FOR FABRICATING DIAMOND NANOSTRUCTURES
First Claim
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1. A method for fabricating diamond nanostructures, comprising:
- applying a hard mask to a surface of a diamond substrate to define thereon a pattern of masked regions having a predetermined diameter surrounded by at least one exposed portion;
vertically etching the exposed portion of the diamond structure to at least the predetermined depth to thereby form a plurality of nanoposts corresponding to the masked regions; and
harvesting at least one nanopost from the diamond substrate, thereby obtaining a nanostructure having a diameter corresponding to the predetermined diameter, and a length corresponding to the predetermined depth.
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Abstract
Techniques for fabricating diamond nanostructures including application of a self-assembled hard mask to a surface of a diamond substrate to define a pattern of masked regions having a predetermined diameter surrounded by an exposed portion. The exposed portion can be vertically etched to a predetermined depth using inductively coupled plasma to form a plurality of nanoposts corresponding to the masked regions. The nanoposts can be harvested to obtain a nanostructure with a diameter corresponding to the predetermined diameter and a length corresponding to the predetermined depth.
39 Citations
25 Claims
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1. A method for fabricating diamond nanostructures, comprising:
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applying a hard mask to a surface of a diamond substrate to define thereon a pattern of masked regions having a predetermined diameter surrounded by at least one exposed portion; vertically etching the exposed portion of the diamond structure to at least the predetermined depth to thereby form a plurality of nanoposts corresponding to the masked regions; and harvesting at least one nanopost from the diamond substrate, thereby obtaining a nanostructure having a diameter corresponding to the predetermined diameter, and a length corresponding to the predetermined depth. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A system for fabricating diamond nanostructures using a diamond substrate, comprising:
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a masking device, adapted for operational coupling to the diamond substrate, and for applying a hard mask to a surface of the diamond substrate to define thereon a pattern of masked regions having a predetermined diameter surrounded by at least one exposed portion; an etching device, adapted for operational coupling to the diamond substrate, and for vertically etching the exposed portion to at least the predetermined depth to thereby form a plurality of nanoposts corresponding to the masked regions; and a harvesting device, adapted for operational coupling to the diamond structure, and for harvesting at least one nanopost from the diamond substrate to obtain a nanostructure having a diameter corresponding to the predetermined diameter, and a length corresponding to the predetermined depth. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification