INTEGRATED PHASE CHANGE SWITCH
First Claim
1. An integrated circuit comprising:
- an active layer comprising a plurality of field effect transistor channels for a plurality of field effect transistors;
an interconnect layer comprising a plurality of conductive interconnects, wherein the plurality of conductive interconnects couple the plurality of field effect transistors;
an insulator layer covering at least a portion of the interconnect layer; and
a channel of a radio-frequency phase change material switch, wherein the channel of the radio-frequency phase change material switch is formed on the insulator layer.
3 Assignments
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Accused Products
Abstract
Various methods and devices that involve phase change material (PCM) switches are disclosed. An exemplary integrated circuit comprises an active layer with a plurality of field effect transistor (FET) channels for a plurality of FETs. The integrated circuit also comprises an interconnect layer comprising a plurality of conductive interconnects. The plurality of conductive interconnects couple the plurality of field effect transistors. The integrated circuit also comprises an insulator layer covering at least a portion of the interconnect layer. The integrated circuit also comprises a channel of a radio-frequency (RF) PCM switch. The channel of the RF PCM switch is formed on the insulator layer.
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Citations
31 Claims
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1. An integrated circuit comprising:
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an active layer comprising a plurality of field effect transistor channels for a plurality of field effect transistors; an interconnect layer comprising a plurality of conductive interconnects, wherein the plurality of conductive interconnects couple the plurality of field effect transistors; an insulator layer covering at least a portion of the interconnect layer; and a channel of a radio-frequency phase change material switch, wherein the channel of the radio-frequency phase change material switch is formed on the insulator layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A monolithic integrated circuit comprising:
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a semiconductor substrate that has been doped to form a plurality of active regions for a plurality of field effect transistors; a radio-frequency phase change material switch having a phase change material channel, a first contact, and a second contact; and an interconnect layer located between the phase change material channel and the semiconductor substrate. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A process for fabricating an integrated circuit comprising:
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forming a plurality of field effect transistor channels in a layer of semiconductor material; forming an interconnect layer comprising a plurality of conductive interconnects, wherein the plurality of conductive interconnects are formed to couple the plurality of field effect transistors; depositing an insulator layer over at least a portion of the interconnect layer; and forming a channel of a radio-frequency phase change material switch on the insulator layer using a first mask. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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Specification