METHOD FOR TREATING A SEMICONDUCTOR DEVICE
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Abstract
A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.
18 Citations
73 Claims
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1-53. -53. (canceled)
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54. A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of sensors having a sensor pad exposed at a surface of the sensor array, the method comprising:
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exposing at least the sensor pad to a wash solution including acid and an organic solvent; and rinsing the wash solution from the sensor pad. - View Dependent Claims (55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71)
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72. A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of the sensors including a sensor pad, a well structure defining a well array corresponding with the sensor array, a well of the well array exposing the sensor pad, a cap attached over the sensor array and the well structure and including an fluid port, a space defined between the cap and the well structure, the method comprising:
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applying a wash solution through the fluid port into the space and waiting for a first period between 30 seconds and 30 minutes, the wash solution including acid and an organic solvent; applying a basic solution through the fluid port into the space and waiting for a second period between 20 seconds and 15 minutes; and applying a rinse solution through the fluid port. - View Dependent Claims (73)
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Specification