SHIELDING FOR THROUGH-SILICON-VIA NOISE COUPLING
First Claim
1. An integrated circuit device, comprising:
- a semiconductor substrate;
an active area disposed in the semiconductor substrate;
a first guard ring disposed in the semiconductor substrate and entirely surrounding the active area, the first guard ring having a first conductivity type;
a via penetrating through the semiconductor substrate and being spaced apart from the active area such that the via is disposed outside of the first guard ring; and
a second guard ring disposed in the semiconductor substrate and entirely surrounding the via and the first guard ring, the second guard ring having the first conductivity type and being disjoint from the first guard ring.
1 Assignment
0 Petitions
Accused Products
Abstract
In some embodiments, an integrated circuit device includes a semiconductor substrate. An active area is disposed in the semiconductor substrate. A first guard ring is disposed in the semiconductor substrate and entirely surrounds the active area. The first guard ring has a first conductivity type. A via penetrates through the semiconductor substrate and is spaced apart from the active area such that the via is disposed outside of the first guard ring. A second guard ring is disposed in the semiconductor substrate and entirely surrounds the via and the first guard ring. The second guard ring has the first conductivity type and is disjoint from the first guard ring.
5 Citations
20 Claims
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1. An integrated circuit device, comprising:
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a semiconductor substrate; an active area disposed in the semiconductor substrate; a first guard ring disposed in the semiconductor substrate and entirely surrounding the active area, the first guard ring having a first conductivity type; a via penetrating through the semiconductor substrate and being spaced apart from the active area such that the via is disposed outside of the first guard ring; and a second guard ring disposed in the semiconductor substrate and entirely surrounding the via and the first guard ring, the second guard ring having the first conductivity type and being disjoint from the first guard ring. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A 3D integrated circuit device, comprising:
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first and second semiconductor substrates; an active area disposed in the first semiconductor substrate; a first guard ring disposed in the first semiconductor substrate and entirely surrounding the active area; a via penetrating through the first semiconductor substrate and being spaced apart from the active area such that the via is disposed outside of the first guard ring, the via forming a connection with a circuit disposed in or on the second substrate; and a second guard ring disposed in the first semiconductor substrate, the second guard ring surrounding the via and being disjoint from the first guard ring, wherein the second guard ring entirely surrounds the first guard ring. - View Dependent Claims (11, 12, 13, 14)
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15. An integrated circuit device, comprising:
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a semiconductor substrate; a through substrate via extending through the semiconductor substrate; a first guard ring surrounding the through substrate via and having a first conductivity type; an active area disposed within the semiconductor substrate and being spaced and apart from both the first guard ring and the through substrate via; and a second guard ring surrounding the active area and having the first conductivity type, the second guard ring being disjoint from the first guard ring and being entirely surrounded by the first guard ring. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification