SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING CONTOUR BASED ASSESSMENTS AND INTEGRATION OVER PROCESS VARIATIONS
First Claim
1. A method for determining a source shape, a mask shape and a target shape for a lithography process comprising:
- formulating an optimization problem by forming a constraint function;
solving, by a hardware processor, the optimization problem by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape; and
outputting the determined source shape and mask shape.
1 Assignment
0 Petitions
Accused Products
Abstract
Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints and formulating an optimization problem that is based on the source, mask and target constraints and incorporates contour-based assessments for the target shape that are based on physical design quality of a circuit. Further, the optimization problem is solved by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape. In addition, the determined source shape and mask shape are output
5 Citations
20 Claims
-
1. A method for determining a source shape, a mask shape and a target shape for a lithography process comprising:
-
formulating an optimization problem by forming a constraint function; solving, by a hardware processor, the optimization problem by integrating over process condition variations to simultaneously determine the source shape, the mask shape and the target shape; and outputting the determined source shape and mask shape. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
-
-
12. A method for determining a source shape, a mask shape and a target shape for a lithography process comprising:
-
formulating an optimization problem by forming a constraint function; solving, by a hardware processor, the optimization problem by maximizing a process window with said source, mask and target constraints to simultaneously determine the source shape, the mask shape and the target shape; and outputting the determined source shape and mask shape. - View Dependent Claims (13, 14, 15)
-
-
16. A system for determining a source shape, a mask shape and a target shape for a lithography process comprising:
-
an objective formulation module configured to formulate an optimization problem by forming a constraint function; and
sa solver, implemented by a hardware processor, configured to solve the optimization problem by minimizing process variability bands with said source, mask and target constraints to simultaneously determine the source shape, the mask shape and the target shape, and configured to output the determined source shape and mask shape. - View Dependent Claims (17, 18, 19, 20)
-
Specification