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METHOD AND APPARATUS FOR CHARACTERIZING METAL OXIDE REDUCTION

  • US 20160111342A1
  • Filed: 10/15/2015
  • Published: 04/21/2016
  • Est. Priority Date: 10/17/2014
  • Status: Abandoned Application
First Claim
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1. A method of characterizing metal oxide reduction, the method comprising:

  • (a) providing a substrate with a metal seed layer formed thereon in a processing chamber;

    (b) generating an oxygen plasma;

    (c) exposing the substrate to the oxygen plasma in the processing chamber to form a metal oxide of the metal seed layer, wherein a temperature of the substrate is below an agglomeration temperature of the metal seed layer; and

    (d) exposing the substrate to a reducing treatment under conditions that reduce the metal oxide to metal in the form of a film integrated with the metal seed layer.

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