REFLECTIVE MASKS FOR USE IN EXTREME ULTRAVIOLET LITHOGRAPHY APPARATUS AND METHODS OF MANUFACTURING THE SAME
First Claim
1. A reflective mask, comprising:
- a reflective multi-layer on a mask substrate;
a plurality of support patterns spaced apart from one another,the support patterns being in a main trench of the reflective multi-layer,the support patterns corresponding to areas of the reflective mask not transferred onto an exposure target substrate, andthe support patterns partitioning the main trench to form a plurality of auxiliary trenches; and
a light absorption pattern including a plurality of auxiliary light absorption patterns, the auxiliary light absorption patterns being in the auxiliary trenches.
1 Assignment
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Accused Products
Abstract
Reflective masks, and methods of manufacturing the same, include a reflective multi-layer on a mask substrate, a plurality of support patterns spaced apart from one another in the main trench. The plurality of support patterns are in a main trench of the reflective multi-layer. The plurality of support patterns correspond to areas of the reflective mask not transferred onto an exposure target substrate. The support patterns partition the main trench to form a plurality of auxiliary trenches. The reflective mask further includes a light absorption pattern including a plurality of auxiliary light absorption patterns in the auxiliary trenches.
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Citations
38 Claims
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1. A reflective mask, comprising:
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a reflective multi-layer on a mask substrate; a plurality of support patterns spaced apart from one another, the support patterns being in a main trench of the reflective multi-layer, the support patterns corresponding to areas of the reflective mask not transferred onto an exposure target substrate, and the support patterns partitioning the main trench to form a plurality of auxiliary trenches; and a light absorption pattern including a plurality of auxiliary light absorption patterns, the auxiliary light absorption patterns being in the auxiliary trenches. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A reflective mask, comprising:
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a reflective multi-layer on a mask substrate; a first light absorption pattern in a first main trench of the reflective multi-layer; and a second light absorption pattern spaced apart from the first light absorption pattern, the second light absorption pattern being in a second main trench of the reflective multi-layer, and the second main trench being wider than the first main trench. - View Dependent Claims (9, 11, 12, 13, 14, 16)
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10. (canceled)
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15. (canceled)
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17-33. -33. (canceled)
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34. A reflective mask, comprising:
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a reflective multi-layer on a mask substrate, the reflective multi-layer including, a first light-absorption region and a second light-absorption region spaced apart from each other, and a reflective support pattern in the second light-absorption region; and a light absorption pattern within the reflective multi-layer and interposed between the reflective support pattern. - View Dependent Claims (35, 36)
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- 37. (canceled)
Specification