ANTIREFLECTION MEMBER, TRANSFER MEMBER, AND METHOD FOR PRODUCING ANTIREFLECTION MEMBER

• US 20160131802A1
• Filed: 11/04/2015
• Published: 05/12/2016
• Est. Priority Date: 11/10/2014
• Status: Active Grant

• Current Assignee: Hiromitsu Tanaka, Norihiro Mizoshita
• Original Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho (Toyota Motor Corporation)
• Inventors: MIZOSHITA, Norihiro, TANAKA, Hiromitsu
• Granted Patent: US 10,451,771 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G02B 1/11 Anti-reflection coatings
• CPC Class Codes: G02B 1/118 having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
• CPC Class Codes: G02B 2207/109 Sols, gels, sol-gel materials

Abstract

An antireflection member, including a resin base member; and a particle layer having mesoporous-silica nanoparticles directly fixed to a surface of the resin base member, wherein the nanoparticles are at least partially embedded in the surface of the resin base member, and the nanoparticles are arranged in a mono-particle layer to form the particle layer.

Claims

1. An antireflection member, comprising:

a resin base member; and

a particle layer comprising mesoporous-silica nanoparticles directly fixed to a surface of the resin base member, wherein

the nanoparticles are at least partially embedded in the surface of the resin base member, and

the nanoparticles are arranged in a mono-particle layer to form the particle layer.

2. The antireflection member according to claim 1, wherein

the nanoparticles have an average particle diameter of 50 to 300 nm, and

an average value of depths of portions of the nanoparticles embedded in the surface of the resin base member is 5 to 70% of the average particle diameter.

5. A method for producing an antireflection member, comprising the steps of:

embedding mesoporous-silica nanoparticles arranged on a surface of a resin base member at least partially in the surface of the resin base member placed in a flowable polymer state; and

fixing the nanoparticles directly to the surface of the resin base member by hardening the surface of the resin base member in the flowable polymer state to thereby obtain the antireflection member according to claim 1.

6. The method for producing an antireflection member according to claim 5, further comprising the step of removing mesoporous-silica nanoparticles which have not been fixed to the surface of the resin base member.

7. The method for producing an antireflection member according to claim 5, wherein

the surface of the resin base member is plasticized into the flowable polymer state by subjecting the surface of the resin base member to at least one plasticizing treatment selected from the group consisting of a solvent vapor treatment, a heat treatment, and a gas treatment.

8. The method for producing an antireflection member according to claim 5, wherein

the resin base member comprises a thermosetting resin or a light-curable resin, and

the nanoparticles are arranged on the surface of the resin base member in an unhardened and flowable polymer state, and are at least partially embedded in the surface.

9. A method for producing an antireflection member according to claim 5, further comprising the step of bringing a transfer member into contact with the resin base member to arrange the mesoporous-silica nanoparticles on the surface of the resin base member by transfer, the transfer member comprising:

a release base member; and

mesoporous-silica nanoparticles provisionally fixed to a surface of the release base member in a detachable state, while forming a mono-particle layer.

3. A transfer member, comprising:

a release base member; and

mesoporous-silica nanoparticles provisionally fixed to a surface of the release base member in a detachable state, while forming a mono-particle layer.

4. The transfer member according to claim 3, wherein

the nanoparticles have an average particle diameter of 50 to 300 nm, and

an average value of depths of portions of the nanoparticles embedded in the surface of the release base member is 2 to 20% of the average particle diameter.