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SYSTEMS AND METHODS FOR FORMING SELECTIVE METAL ELECTRODE LAYERS FOR RESISTIVE SWITCHING MEMORIES

  • US 20160138166A1
  • Filed: 11/19/2014
  • Published: 05/19/2016
  • Est. Priority Date: 11/19/2014
  • Status: Abandoned Application
First Claim
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1. A method for selectively depositing a platinum layer on a substrate, comprising:

  • providing an electroless deposition solution including a platinum precursor and at least one of water and/or a pH balancing solution;

    immersing a substrate including a patterned metal layer and one or more dielectric layers in the electroless deposition solution for a first predetermined period,wherein the platinum layer is selectively deposited on the patterned metal layer but not on the one or more dielectric layers; and

    removing the substrate from the electroless deposition solution after the first predetermined period.

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