LITHOGRAPHY PROCESS WINDOW PREDICTION BASED ON DESIGN DATA
First Claim
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1. A method of manufacturing a semiconductor device, comprising:
- providing design data;
producing lithography masks based on said design data;
predicting a product process window; and
producing a wafer including semiconductor structures by means of said lithography masks and observing conditions defined by said product process window.
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Abstract
A method of manufacturing a semiconductor device, comprising providing design data, producing lithography masks based on the design data, predicting a product process window and producing a wafer including semiconductor structures by means of the lithography masks and observing conditions defined by the product process window.
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Citations
13 Claims
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1. A method of manufacturing a semiconductor device, comprising:
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providing design data; producing lithography masks based on said design data; predicting a product process window; and producing a wafer including semiconductor structures by means of said lithography masks and observing conditions defined by said product process window. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A lithography method for manufacturing an integrated circuit, comprising:
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providing a design data comprising layouts for semiconductor devices; designing and producing photolithography masks based on said design data; predicting a product process window; and producing a wafer including said semiconductor devices forming said integrated circuit based on said produced photolithography masks and said predicted product process window. - View Dependent Claims (11, 12, 13)
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Specification