ELECTRODE PATTERN, MANUFACTURING METHOD THEREOF, AND TOUCH SENSOR INCLUDING THE SAME

• US 20160170521A1
• Filed: 05/15/2015
• Published: 06/16/2016
• Est. Priority Date: 12/11/2014
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: CHOI, Shin Il, KIM, Jae Neung, BAE, Su Bin, JEONG, Yu-Gwang
• Granted Patent: US 10,126,886 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G06F 2203/04103 Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
• CPC Class Codes: G06F 2203/04111 Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
• CPC Class Codes: G06F 2203/04112 Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
• CPC Class Codes: G06F 3/0443 using a single layer of sensing electrodes
• CPC Class Codes: G06F 3/0446 using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes

Abstract

A transparent electrode pattern includes a first electrode including a first lower conductive layer and a first upper conductive layer located on the first lower conductive layer and a second electrode spaced apart from the first electrode and including a second lower conductive layer and a second upper conductive layer positioned on the second lower conductive layer. The first and second lower conductive layers may include a metal nanowire. The first and second upper conductive layers may include a transparent conductive material that is dry-etchable.

Claims

1. A transparent electrode pattern, comprising:

a first electrode including a first lower conductive layer and a first upper conductive layer located on the first lower conductive layer; and

a second electrode spaced apart from the first electrode and including a second lower conductive layer and a second upper conductive layer positioned on the second lower conductive layer,

wherein the first and second lower conductive layers include a metal nanowire, and

the first and second upper conductive layers include a transparent conductive material that is dry-etchable.

2. The transparent electrode pattern as claimed in claim 1, wherein:

the first and second upper conductive layers include GTO (gallium tin oxide).

3. The transparent electrode pattern as claimed in claim 2, wherein:

an edge of the first lower conductive layer and an edge of the first upper conductive layer are substantially aligned, and

an edge of the second lower conductive layer and an edge of the second upper conductive layer are substantially aligned.

4. The transparent electrode pattern as claimed in claim 3, wherein:

the first and second lower conductive layers further include an overcoat.

5. The transparent electrode pattern as claimed in claim 4, wherein:

the overcoat extends to be positioned between the first lower conductive layer and the second lower conductive layer.

6. A transparent electrode pattern, comprising:

a first electrode including a first lower conductive layer and a first upper conductive layer positioned on the first lower conductive layer; and

a second electrode spaced apart from the first electrode and including a second lower conductive layer and a second upper conductive layer positioned on the second lower conductive layer,

wherein the first and second lower conductive layers include a metal nanowire, and

the first and second upper conductive layers include a transparent conductive material and

a plasma gas composition including chlorine (Cl) or bromine (Br) is present on a surface of the first and second upper conductive layers.

7. The transparent electrode pattern as claimed in claim 6, wherein:

the first and second upper conductive layers include a conductive metal oxide.

8. The transparent electrode pattern as claimed in claim 7, wherein:

an edge of the first lower conductive layer and an edge of the first upper conductive layer are substantially aligned, and

an edge of the second lower conductive layer and an edge of the second upper conductive layer are substantially aligned.

9. The transparent electrode pattern as claimed in claim 8, wherein:

the first and second lower conductive layers further include an overcoat.

10. The transparent electrode pattern as claimed in claim 9, wherein

the overcoat extends to be positioned between the first lower conductive layer and the second lower conductive layer.

11. A method for manufacturing a transparent electrode pattern, the method comprising:

forming a lower conductive layer including a metal nanowire on a substrate;

depositing a transparent conductive material that is dry-etchable on the lower conductive layer to form an upper conductive layer;

forming a photosensitive film pattern on the upper conductive layer;

dry-etching the upper conductive layer using the photosensitive film pattern as a mask and using an etching gas; and

stripping the photosensitive film pattern.

12. The method as claimed in claim 11, wherein:

in dry-etching the upper conductive layer, the metal nanowire and the etching gas react, thereby forming a metal compound, and

stripping the photosensitive film pattern includes removing the metal compound of the lower conductive layer that is not covered by the photosensitive film pattern.

13. The method as claimed in claim 12, wherein:

the upper conductive layer includes GTO (gallium tin oxide).

14. The method as claimed in claim 13, wherein:

the lower conductive layer includes an overcoat, and

dry-etching the upper conductive layer includes etching at least a portion of the overcoat.

15. A method for manufacturing a transparent electrode pattern, the method comprising:

forming a lower conductive layer including a metal nanowire on a substrate;

forming a photosensitive film pattern on the lower conductive layer;

reflowing the photosensitive film pattern to form an undercut structure;

depositing a transparent conductive material on the photosensitive film pattern and the lower conductive layer to form an upper conductive layer;

stripping the photosensitive film pattern and lifting off the upper conductive layer positioned on the photosensitive film pattern to form a first upper conductive layer and a second upper conductive layer that are separated from each other;

plasma treating an upper face of the first and second upper conductive layers and the lower conductive layer; and

removing a metal compound formed by reacting of the metal nanowire with a plasma gas in the plasma treatment.

16. The method as claimed in claim 15, wherein:

the plasma gas includes chlorine (CO or bromine (Br).

17. A touch sensor, comprising:

a plurality of touch electrodes, the plurality of touch electrodes including;

a first electrode including a first lower conductive layer and a first upper conductive layer positioned on the first lower conductive layer; and

a second electrode spaced apart from the first electrode and including a second lower conductive layer and a second upper conductive layer positioned on the second lower conductive layer,

wherein the first and second lower conductive layers include a metal nanowire, and

the first and second upper conductive layers include a transparent conductive material that is dry-etchable.

18. The touch sensor as claimed in claim 17, wherein:

the first and second upper conductive layers include GTO (gallium tin oxide).

19. A touch sensor, comprising

a plurality of touch electrodes, the plurality of touch electrodes including:

a first electrode including a first lower conductive layer and a first upper conductive layer positioned on the first lower conductive layer; and

a second electrode spaced apart from the first electrode and including a second lower conductive layer and a second upper conductive layer positioned on the second lower conductive layer,

wherein;

the first and second lower conductive layers include a metal nanowire,

the first and second upper conductive layers include a transparent conductive material, and

a plasma gas composition including chlorine (Cl) or bromine (Br) is present on a surface of the first and second upper conductive layers.

20. The touch sensor as claimed in claim 19, wherein:

an edge of the first lower conductive layer and an edge of the first upper conductive layer are substantially aligned, and

an edge of the second lower conductive layer and an edge of the second upper conductive layer are substantially aligned.