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GRID FOR PLASMA ION IMPLANT

  • US 20160204295A1
  • Filed: 03/17/2016
  • Published: 07/14/2016
  • Est. Priority Date: 12/19/2012
  • Status: Active Grant
First Claim
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1. A plasma ion implant system for implanting ions into a substrate so as to form lines for interdigitated back-contact solar cell, comprising:

  • a processing chamber;

    a grid assembly placed in the plasma chamber and dividing the processing chamber into a plasma section and ion implant section, the grid assembly configured to form beamlets of ions having divergence in a direction parallel to the lines;

    a transport mechanism for transporting substrates in a travel direction and positioning the substrate under the grid assembly;

    a plurality of masks, each mask placed on one substrate and comprising a plurality of elongated holes forming line segments arranged in parallel rows that are parallel to the lines for interdigitated back-contact solar cell, wherein line segments in each row are separated by bridges that block ions impinging thereupon and the line segments in each row correspond to one implanted line forming the lines for interdigitated back-contact solar cell; and

    ,wherein the divergence in the beamlets is configured to be in the direction parallel to the line segments of the mask so as to provide a trajectory for ions to be implanted under the bridges.

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