EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE
First Claim
1. A liquid immersion exposure method of exposing a substrate with exposure light through immersion liquid, the method comprising:
- arranging a projection system having the optical element;
arranging a stage system having a holder configured to hold the substrate;
arranging a supply port via which the immersion liquid is supplied, the supply port being arranged such that an upper surface of the substrate held on the holder faces the supply port;
arranging a recovery port via which the immersion liquid is collected, the recovery port being arranged such that the upper surface of the substrate held on the holder faces the recovery port and such that the recovery port surrounds the supply port, the recovery port collecting the immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid;
detecting an alignment mark of the substrate held on the holder not through the immersion liquid by an alignment system, the alignment system being arranged apart from the projection system; and
positioning the substrate held on the holder based on a detection result of the alignment system to align the substrate with the exposure light projected through the immersion liquid by the projection system.
0 Assignments
0 Petitions
Accused Products
Abstract
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.
-
Citations
33 Claims
-
1. A liquid immersion exposure method of exposing a substrate with exposure light through immersion liquid, the method comprising:
-
arranging a projection system having the optical element; arranging a stage system having a holder configured to hold the substrate; arranging a supply port via which the immersion liquid is supplied, the supply port being arranged such that an upper surface of the substrate held on the holder faces the supply port; arranging a recovery port via which the immersion liquid is collected, the recovery port being arranged such that the upper surface of the substrate held on the holder faces the recovery port and such that the recovery port surrounds the supply port, the recovery port collecting the immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid; detecting an alignment mark of the substrate held on the holder not through the immersion liquid by an alignment system, the alignment system being arranged apart from the projection system; and positioning the substrate held on the holder based on a detection result of the alignment system to align the substrate with the exposure light projected through the immersion liquid by the projection system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
-
-
16. A liquid immersion exposure method comprising:
-
holding a substrate on a holder of a movable stage; supplying immersion liquid via a supply port which is arranged such that an upper surface of the substrate held on the holder faces the supply port; collecting the immersion liquid via a recovery port which is arranged such that the upper surface of the substrate held on the holder faces the recovery port and such that the recovery port surrounds the supply port, the recovery port collecting the immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid; detecting an alignment mark of the substrate held on the holder not through the immersion liquid, positioning the substrate held on the holder based on a result of the mark detection to align the substrate with the exposure light projected by a projection system through the immersion liquid; and exposing the substrate with the exposure light through the immersion liquid between the projection system and the substrate. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
-
Specification