Monitoring a Discharge in a Plasma Process
First Claim
1. A plasma discharge monitor comprising:
- a signal detector responsive toat least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, andat least a second signal path of at least one plasma supply signal within at least a second time range located at one or more points corresponding to the first time range in at least one other period of the plasma supply signal; and
an identification signal generator configured to generate an identification signal if the second signal path deviates by at least a distance from the first signal path, wherein the distance has a minimum time difference and a minimum signal amplitude difference.
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Abstract
Devices and methods for monitoring a discharge in a plasma process are provided. An example method includes detecting at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, detecting at least a second signal path of the at least one plasma supply signal within at least a second time range which is at the point corresponding to the first time range in at least one other period of the plasma supply signal, and generating an identification signal if the second signal path deviates by at least a distance from the first signal path. The distance has a minimum time difference and a minimum signal amplitude difference. The method enables to identify arcs in a very reliable and very rapid manner.
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Citations
20 Claims
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1. A plasma discharge monitor comprising:
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a signal detector responsive to at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, and at least a second signal path of at least one plasma supply signal within at least a second time range located at one or more points corresponding to the first time range in at least one other period of the plasma supply signal; and an identification signal generator configured to generate an identification signal if the second signal path deviates by at least a distance from the first signal path, wherein the distance has a minimum time difference and a minimum signal amplitude difference. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of monitoring a discharge in a plasma process, comprising:
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detecting at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal; detecting at least a second signal path of at least one plasma supply signal within at least a second time range located at one or more points corresponding to the first time range in at least one other period of the plasma supply signal; and generating an identification signal if the second signal path deviates by at least a distance from the first signal path, wherein the distance has a minimum time difference and a minimum signal amplitude difference. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A plasma process system comprising:
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a power generator configured to supply power to a plasma process with a periodically changing output signal of the power generator; and a plasma discharge monitor for monitoring a discharge in the plasma process, comprising; a signal detector responsive to at least a first signal path of at least one plasma supply signal within at least a first time range within at least one period of the plasma supply signal, and at least a second signal path of at least one plasma supply signal within at least a second time range located at one or more points corresponding to the first time range in at least one other period of the plasma supply signal; and an identification signal generator configured to generate an identification signal if the second signal path deviates by at least a distance from the first signal path, wherein the distance has a minimum time difference and a minimum signal amplitude difference. - View Dependent Claims (17, 18, 19, 20)
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Specification