METHODS AND DEVICES FOR DE NOVO OLIGONUCLEIC ACID ASSEMBLY
First Claim
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1. A method for preparing a surface for oligonucleic acid synthesis, the method comprising:
- (a) providing a silicon wafer comprising a surface;
(b) depositing a first molecule on the surface at a first region, wherein the first molecule binds to the surface and lacks a reactive group that binds to a nucleoside phosphoramidite;
(c) depositing a second molecule on the surface at a second region, wherein the second region comprises a plurality of loci, wherein each locus is surrounded by the first region, and wherein the second molecule binds to the surface and lacks a reactive group that binds to a nucleoside phosphoramidite; and
(d) depositing a mixture on the surface at the second region, wherein the mixture comprises the second molecule and a third molecule, wherein the third molecule binds to the surface and is capable of binding nucleoside phosphoramidite, and wherein the second molecule and the third molecule are present in the mixture in a molar ratio of 10;
1 to about 2500;
1.
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Abstract
Methods and devices are provided herein for surfaces for de novo nucleic acid synthesis which provide for low error rates. In addition, methods and devices are provided herein for increased nucleic acid mass yield resulting from de novo nucleic acid synthesis.
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Citations
114 Claims
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1. A method for preparing a surface for oligonucleic acid synthesis, the method comprising:
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(a) providing a silicon wafer comprising a surface; (b) depositing a first molecule on the surface at a first region, wherein the first molecule binds to the surface and lacks a reactive group that binds to a nucleoside phosphoramidite; (c) depositing a second molecule on the surface at a second region, wherein the second region comprises a plurality of loci, wherein each locus is surrounded by the first region, and wherein the second molecule binds to the surface and lacks a reactive group that binds to a nucleoside phosphoramidite; and (d) depositing a mixture on the surface at the second region, wherein the mixture comprises the second molecule and a third molecule, wherein the third molecule binds to the surface and is capable of binding nucleoside phosphoramidite, and wherein the second molecule and the third molecule are present in the mixture in a molar ratio of 10;
1 to about 2500;
1. - View Dependent Claims (2, 3, 4, 5, 7, 8, 9, 10, 11, 13, 14, 16, 17, 18, 36)
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6. (canceled)
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12. (canceled)
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15. (canceled)
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19-35. -35. (canceled)
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37. A method for oligonucleic acid synthesis, the method comprising:
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(a) providing predetermined sequences for at least 20,000 non-identical oligonucleic acids; (b) providing a silicon wafer comprising a patterned surface, wherein the patterned surface is generated by; depositing a first molecule on the surface at a first region, wherein the first region comprises a plurality of loci, and wherein the first molecule binds to the surface and lacks a reactive group that binds to a nucleoside phosphoramidite; and depositing a mixture on the surface at the first region, wherein the mixture comprises the first molecule and a second molecule, wherein the second molecule binds to the surface and is capable of binding nucleoside phosphoramidite, and wherein the first molecule and the second molecule are present in the mixture in a molar ratio of 10;
1 to about 2500;
1; and(c) synthesizing the at least 20,000 non-identical oligonucleic acids each at least 10 bases in length, wherein the at least 20,000 non-identical oligonucleic acids encode sequences with an aggregate deletion error rate of less than 1 in 1500 bases compared to the predetermined sequences, and wherein each of the at least 20,000 non-identical oligonucleic acids extends from a different locus. - View Dependent Claims (38, 39, 40, 41, 42, 44, 45, 46, 47, 49, 55, 56, 57, 58, 62)
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43. (canceled)
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48. (canceled)
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50-54. -54. (canceled)
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59-61. -61. (canceled)
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63-82. -82. (canceled)
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83. A device for oligonucleic acid synthesis, the device comprising:
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(a) a silicon wafer having a surface; (b) a plurality of recesses or protrusions on the surface, wherein each recess or protrusion comprises; (i) a width distance that is 6.8 nm to 500 nm, (ii) a pitch distance that is about twice the width distance, and (iii) a depth distance that is about 60% to about 125% of the pitch distance; and (c) a plurality of loci on the surface, wherein each locus has a diameter of 0.5 to 100 μ
m, and wherein each locus comprises at least two of the plurality of recesses or protrusions. - View Dependent Claims (88, 93, 94, 95, 97, 98, 99, 100, 102, 108, 113, 114)
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84-87. -87. (canceled)
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89-92. -92. (canceled)
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96. (canceled)
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101. (canceled)
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103-107. -107. (canceled)
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109-112. -112. (canceled)
Specification