SOLID-STATE IMAGING DEVICE, IMAGING DEVICE, SOLID-STATE IMAGING DEVICE MANUFACTURING METHOD
First Claim
1. A solid-state imaging device, comprising:
- a plurality of substrates provided to be overlapped; and
a connection structure,wherein each of the substrates includes a semiconductor layer in which a photoelectric conversion unit configured to convert incident light to a signal is formed, and an interconnection layer in which an interconnection configured to transmit the signal is formed and which overlaps the semiconductor layer,the semiconductor layer of a first substrate and the interconnection layer of a second substrate in two adjacent substrates among the plurality of substrates are disposed to face each other, andthe connection structure is formed on a surface which faces the semiconductor layer of the first substrate of the interconnection layer of the second substrate to electrically connect the interconnection layer of the first substrate and the interconnection layer of the second substrate, and passes through only the semiconductor layer of the first substrate out of the semiconductor layer of the first substrate and the interconnection layer of the second substrate.
1 Assignment
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Accused Products
Abstract
A solid-state imaging device includes a plurality of substrates provided to be overlapped and a connection structure. Each of the substrates includes a semiconductor layer in which a photoelectric conversion unit configured to convert incident light to a signal is formed, and an interconnection layer in which an interconnection configured to transmit the signal is formed and which overlaps the semiconductor layer. The semiconductor layer of a first substrate and the interconnection layer of a second substrate in two adjacent substrates among the plurality of substrates are disposed to face each other. The connection structure electrically connects the interconnection layer of the first substrate and the interconnection layer of the second substrate, and passes through only the semiconductor layer of the first substrate out of the semiconductor layer of the first substrate and the interconnection layer of the second substrate.
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Citations
9 Claims
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1. A solid-state imaging device, comprising:
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a plurality of substrates provided to be overlapped; and a connection structure, wherein each of the substrates includes a semiconductor layer in which a photoelectric conversion unit configured to convert incident light to a signal is formed, and an interconnection layer in which an interconnection configured to transmit the signal is formed and which overlaps the semiconductor layer, the semiconductor layer of a first substrate and the interconnection layer of a second substrate in two adjacent substrates among the plurality of substrates are disposed to face each other, and the connection structure is formed on a surface which faces the semiconductor layer of the first substrate of the interconnection layer of the second substrate to electrically connect the interconnection layer of the first substrate and the interconnection layer of the second substrate, and passes through only the semiconductor layer of the first substrate out of the semiconductor layer of the first substrate and the interconnection layer of the second substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of manufacturing a solid-state imaging device, comprising:
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etching a part of a semiconductor layer of a first substrate including the semiconductor layer in which a photoelectric conversion unit configured to convert incident light to a signal is formed, and an interconnection layer in which an interconnection configured to transmit the signal is formed and which overlaps the semiconductor layer, to expose the interconnection layer of the first substrate; forming a connection structure which is electrically connected to the interconnection layer of a second substrate including the semiconductor layer and the interconnection layer on a surface of the interconnection layer of the second substrate; and electrically connecting the connection structure which is formed on the surface of the interconnection layer of the second substrate to the interconnection layer of the first substrate which is exposed by the etching of the semiconductor layer of the first substrate in a state in which the semiconductor layer of the first substrate and the interconnection layer of the second substrate face each other.
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Specification