WIRE GRID POLARIZER AND METHOD OF FABRICATING THE SAME

• US 20160266294A1
• Filed: 08/27/2015
• Published: 09/15/2016
• Est. Priority Date: 03/09/2015
• Status: Abandoned Application

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: YOON, Dae Ho, XIE, Lei, PARK, Seung Won, LEE, Moon Gyu
• Application Number:
  US14/838,358
• Publication Number:
  US 20160266294A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G02B 5/3058 comprising electrically conductive elements, e.g. wire grids, conductive particles

Abstract

A wire grid polarizer includes a substrate, a plurality of conductive wire patterns which protrudes from a surface of the substrate and each extends in a direction to be substantially parallel to each other, a flaw which is provided in at least one of the conductive wire patterns and protrudes in a direction different from the direction in which the conductive wire patterns extend, and a blocking portion which blocks the flaw.

Claims

1. A wire grid polarizer comprising:

a substrate;

a plurality of conductive wire patterns which protrudes from a surface of the substrate and each extends in a direction to be substantially parallel to each other;

a flaw which is provided in at least one of the plurality of conductive wire patterns and protrudes in a direction different from the direction in which the plurality of conductive wire patterns extend; and

a blocking portion which blocks the flaw.

2. The wire grid polarizer of claim 1, wherein the blocking portion is integrally provided with a conductive wire pattern of the plurality of conductive wire patterns having the flaw.

3. The wire grid polarizer of claim 2, wherein the blocking portion is wider than the conductive wire pattern having the flaw.

4. The wire grid polarizer of claim 2, wherein distances between the blocking portion and conductive wire patterns adjacent to both sides of the conductive wire pattern including the blocking portion are equal to or smaller than a distance between conductive wire patterns without blocking portions.

5. The wire grid polarizer of claim 2, wherein the blocking portion includes the same material as the conductive wire pattern having the flaw.

6. The wire grid polarizer of claim 1, wherein the blocking portion is located on a conductive wire pattern of the plurality of conductive wire patterns having the flaw.

7. The wire grid polarizer of claim 6, wherein the blocking portion is located on the conductive wire pattern having the flaw and a conductive wire pattern adjacent to the conductive wire pattern.

8. The wire grid polarizer of claim 6, wherein the blocking portion blocks light in a visible wavelength range.

9. The wire grid polarizer of claim 8, wherein the blocking portion includes a negative photosensitive resin composition.

10. The wire grid polarizer of claim 1, further comprising a reflective layer located on the substrate between the conductive wire patterns.

11. A method of fabricating a wire grid polarizer, the method comprising:

forming a pattern layer on a substrate;

forming conductive wire patterns by patterning the pattern layer; and

melting a flaw provided in at least one of the conductive wire patterns.

12. The method of claim 11, wherein the melting of the flaw is performed by irradiating a laser beam to the flaw.

13. The method of claim 12, wherein the laser beam is irradiated toward the conductive wire patterns from a surface of the substrate.

14. The method of claim 11, further comprising detecting the flaw before the melting of the flaw.

15. A method of fabricating a wire grid polarizer, the method comprising:

forming a pattern layer on a surface of a substrate;

forming conductive wire patterns by patterning the pattern layer;

coating a photosensitive layer, which includes a photosensitive resin composition, on the conductive wire patterns;

forming a blocking portion by exposing the photosensitive layer to light; and

removing the photosensitive layer excluding the blocking portion.

16. The method of claim 15, wherein the photosensitive resin composition comprises a negative photosensitive resin composition.

17. The method of claim 15, wherein the blocking portion blocks light in a visible wavelength range.

18. The method of claim 15, wherein the forming the blocking portion is performed by irradiating light toward the photosensitive layer from the other surface of the substrate.

19. The method of claim 18, wherein the conductive wire patterns are arranged in a direction to be substantially parallel to each other, and the light is light of a first polarization parallel to the direction in which the conductive wire patterns are arranged.

20. The method of claim 19, wherein the forming the blocking portion comprises transmitting the light of the first polarization through the conductive wire patterns and letting a portion of the photosensitive layer, which is exposed to the transmitted light, be cured.