Controlled Diffuser Device

• US 20160271287A1
• Filed: 12/18/2015
• Published: 09/22/2016
• Est. Priority Date: 03/18/2015
• Status: Active Application

• Current Assignee: Scent2Market, Inc.
• Original Assignee: Scent2Market, Inc.
• Inventors: D'Amico, Daniel M.
• Granted Patent: US 10,258,708 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: A61L 2209/11 Apparatus for controlling air treatment
• CPC Class Codes: A61L 2209/134 Distributing means, e.g. baffles, valves, manifolds, nozzles
• CPC Class Codes: A61L 9/042 with the help of a macromolecular compound as a carrier or diluent A61L9/048 takes precedence
• CPC Class Codes: A61L 9/12 Apparatus, e.g. holders, therefor

Abstract

A controlled diffuser device can include a cover, a louver panel, a substrate member, and a base is disclosed. A cover and a base can be configured to affix to each other to sandwich a substrate member and a louver panel while enabling a substrate member and louver panel to slidably engage a base upper surface. A substrate member may comprise a material that changes in a physical dimension as it diffuses aromatic components. Because of static securement and slidable engagement configurations, a louver panel operatively shutters apertures of a cover to selectively moderate varying degrees of exposure of a substrate member as a substrate member changes in a physical dimension. Other embodiments may include a base configured to receive a substrate member and have a cover placed over top. As the substrate changed in physical dimension, the cover can be caused to move relative to the base.

Claims

1. A shuttering device, comprising:

at least one cover having at least one cover aperture;

at least one louver panel;

at least one substrate member having a substrate member first end and a substrate member second end;

at least one base;

at least one first end retention mechanism to statically secure said at least one substrate member first end to said at least one base; and

,

at least one second end retention mechanism to statically secure said louver panel to said substrate member second end;

wherein at least one of said at least one substrate member and said at least one louver panel is configured to move relative to said base;

wherein said substrate member comprises a material that changes at least one physical dimension upon being exposed to a change in conditions; and

,

wherein upon said change in physical dimension said substrate member second end is forced to move relative to said substrate member first end, which forces said at least one louver panel in a direction;

said at least one substrate member and said at least one louver panel move relative to said at least one base and said at least one cover;

as said at least one louver panel moves relative to said at least one cover, said at least one louver panel traverses an opening of said at least one cover aperture.

2. The shuttering device recited in claim 1, wherein said at least one substrate member is provided with aromatic components that diffuse upon said change in vapor pressure.

3. The device recited in claim 1, further comprising at least one attachment mechanism to affix said device to an ancillary structure.

4. The device recited in claim 1, further comprising at least one fastening mechanism to affix said at least one cover to said at least one base.

5. The device recited in claim 1, wherein said at least one substrate member comprises EVA.

6. A shuttering device, comprising:

at least one cover having a cover upper surface, a cover lower surface, and at least one cover aperture;

at least one louver panel having a louver panel upper surface, a louver panel lower surface, a central member, and at least one tine;

at least one substrate member having a substrate member first end and a substrate member second end;

at least one base having a base upper surface and a base lower surface;

at least one first end retention mechanism to statically secure said at least one substrate member first end to said at least one base upper surface; and

,

at least one second end retention mechanism to statically secure said louver panel lower surface to said substrate member second end;

wherein at least one of said at least one substrate member and said at least one louver panel is configured to slidably engage said base upper surface;

wherein said substrate member comprises a material that changes at least one physical dimension upon being exposed to a change in vapor pressure; and

,

wherein upon said change in physical dimension said substrate member second end is forced to move relative to said substrate member first end, which forces said at least one louver panel in a direction;

said at least one substrate member and said at least one louver panel move relative to said at least one base and said at least one cover;

as said at least one louver panel moves relative to said at least one cover, said at least one tine traverses an opening of said at least one cover aperture to regulate exposure of said at least one substrate member to an environment outside of said device.

7. The shuttering device recited in claim 6, wherein said at least one substrate member is provided with aromatic components that diffuse upon said change in vapor pressure.

8. The device recited in claim 6, further comprising at least one attachment mechanism to affix said device to an ancillary structure.

9. The device recited in claim 6, further comprising at least one fastening mechanism to affix said at least one cover to said at least one base.

10. The device recited in claim 6, wherein said at least one substrate member comprises EVA.

11. A shuttering device, comprising:

at least one cover having a cover upper surface, a cover lower surface, and at least one cover aperture;

at least one louver having a louver upper surface and a louver lower surface, wherein each louver is rotatingly attached to said at least one cover aperture and configured to selectively obstruct said at least one cover aperture;

at least one substrate member having a substrate member first end and a substrate member second end;

at least one base having a base upper surface and a base lower surface;

at least one first end retention mechanism to statically secure said at least one substrate member first end to said at least one base upper surface;

wherein said at least one louver is in mechanical communication with said substrate member second end;

wherein said at least one substrate member is configured to slidably engage said base upper surface;

wherein said substrate member comprises a material that changes at least one physical dimension upon being exposed to a change in vapor pressure; and

,

wherein upon said change in physical dimension said substrate member second end is forced to move relative to said substrate member first end, which forces said at least one louver to rotate;

said at least one substrate member moves relative to said at least one base and said at least one cover while said at least one louver rotates to selectively obstruct an opening of said at least one cover aperture to regulate exposure of said at least one substrate member to an environment outside of said device.

12. The shuttering device recited in claim 11, wherein said at least one substrate member is provided with aromatic components that diffuse upon said change in vapor pressure.

13. The device recited in claim 11, further comprising at least one attachment mechanism to affix said device to an ancillary structure.

14. The device recited in claim 11, further comprising at least one fastening mechanism to affix said at least one cover to said at least one base.

15. The device recited in claim 11, wherein said at least one substrate member comprises EVA.

16. A shuttering device, comprising:

at least one cover having cover upper surface, a cover lower surface, and at least one cover aperture;

at least one base having a base upper surface, a base lower surface, and at least one base aperture;

at least one louver panel having a louver panel upper surface, a louver panel lower surface, a central member, and at least one tine;

at least one louver having a louver upper surface and a louver lower surface, wherein each louver is rotatingly attached to at least one of said at least one cover aperture and said at least one base aperture, wherein said at least one louver is configured to selectively obstruct at least one of said at least one cover aperture and said at least one base aperture;

at least one substrate member having a substrate member first end and a substrate member second end;

at least one first end retention mechanism to statically secure said at least one substrate member first end to said at least one base upper surface; and

,

at least one second end retention mechanism to statically secure said louver panel lower surface to said substrate member second end;

wherein said at least one louver is in mechanical communication with said substrate member second end;

wherein at least one of said at least one substrate member and said at least one louver panel is configured to slidably engage said base upper surface;

wherein said substrate member comprises a material that changes at least one physical dimension upon being exposed to a change in vapor pressure, wherein;

upon said change in physical dimension said substrate member second end is forced to move relative to said substrate member first end, which forces said at least one louver panel in a direction;

said at least one substrate member and said at least one louver panel move relative to said at least one base and said at least one cover;

as said at least one louver panel moves relative to said at least one cover, said at least one tine traverses an opening of at least one of said at least one cover aperture and said at least one base aperture to regulate exposure of said at least one substrate member to an environment outside of said device; and

;

upon said change in physical dimension said substrate member second end is forced to move relative to said substrate member first end, which forces said at least one louver to rotate;

said at least one substrate member moves relative to said at least one base and said at least one cover while said at least one louver rotates to selectively obstruct an opening of at least one of said at least one cover aperture and said at least one base aperture to regulate exposure of said at least one substrate member to an environment outside of said device.

17. The shuttering device recited in claim 16, wherein said at least one substrate member is provided with aromatic components that diffuse upon said change in vapor pressure.

18. The device recited in claim 16, further comprising at least one attachment mechanism to affix said device to an ancillary structure.

19. The device recited in claim 16, further comprising at least one fastening mechanism to affix said at least one cover to said at least one base.

20. The device recited in claim 16, wherein said at least one substrate member comprises EVA.

21. A shuttering device, comprising:

a base having a base bottom with conjoined base sides and an open base top forming a base interior cavity;

a substrate member configured to slidably insert into said base interior cavity, wherein said substrate member comprises a material that changes at least one physical dimension upon being exposed to a change in conditions; and

,

a cover having a cover top with conjoined cover sides and an open cover bottom forming a cover interior cavity, said cover interior cavity configured to receive at least said base top and a portion of said substrate member when said substrate member is inserted into said base interior cavity and said cover is placed over top of said base;

wherein said substrate member is configured to sit within said base interior cavity such that when said cover is placed over top said base, said cover rests upon said substrate member; and

,

wherein when said substrate member changes at least one physical dimension, said cover moves relative to said base.

22. The device recited in claim 21, wherein at least one of said base side and said base cover has at least one vent aperture formed therein.

23. The device recited in claim 21, wherein said substrate member has at least one aperture formed therein.

24. The device recited in claim 21, further comprising an end-of-life indicator.

25. The device recited in claim 21, wherein said base bottom is structured to cause the base to stand freely upright with said base top facing upwards.

26. The device recited in claim 21, wherein said base bottom is structured to cause the base to stand freely upright with said base top facing upwards with said substrate member inserted into said base and said cover placed over top of said base.

27. The device recited in claim 22, wherein said at least one vent aperture is at least one of shuttered and opened as said cover moves relative to said base.