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METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED STRUCTURES

  • US 20160284077A1
  • Filed: 02/23/2016
  • Published: 09/29/2016
  • Est. Priority Date: 06/17/2010
  • Status: Active Grant
First Claim
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1. A method for use in measuring of patterned structures, the method comprising:

  • providing first type measured data and second type measured data about the structure, the first and second types of measured data corresponding to first and second measurements based on different physical principles and being therefore different from one another; and

    processing and analyzing the first and second types measured data and further optimizing at least one of first and second data interpretation models for interpretation of at least one of the first type measured data and the second type measured data.

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