DISPLAY DEVICE STRUCTURE AND MANUFACTURING METHOD THEREOF

• US 20160322429A1
• Filed: 04/26/2016
• Published: 11/03/2016
• Est. Priority Date: 04/28/2015
• Status: Abandoned Application

• Current Assignee: Everdisplay Optonics (Shanghai) Limited
• Original Assignee: Everdisplay Optonics (Shanghai) Limited
• Inventors: CHEN, Jr-Hong, SU, Weisheng, ZHANG, Qiguo
• Application Number:
  US15/138,714
• Publication Number:
  US 20160322429A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G06F 2203/04103 Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
• CPC Class Codes: G06F 3/0412 Digitisers structurally integrated in a display
• CPC Class Codes: G06F 3/0445 using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
• CPC Class Codes: H10K 50/858 comprising refractive means, e.g. lenses
• CPC Class Codes: H10K 59/122 Pixel-defining structures or layers, e.g. banks
• CPC Class Codes: H10K 59/40 OLEDs integrated with touch screens

Abstract

The invention relates to the field of OLED display technology, more particularly, to a display device structure and manufacturing method thereof applied to an AMOLED device; the technical solution of the invention is mainly to form a drive electrode between the PLN layer and the pixel design layer in the sensing area namely the area of the forming sensor, and sets an insulation layer and sensing electrode above the top of the pixel design layer; thereby the drive electrode, the insulation layer and the sensing electrode form an embedded sensor, therefore the technical solution of the invention can effectively solve the technical problems of the difficulty of alignment, Mura and the complicated integrated lead, and reduce the thickness of the screen and the structural design difficulty of the terminal products.

Claims

1. A display device structure, comprising:

a substrate, provided with a display area and a sensing area;

a planarization layer, disposed on the substrate;

an OLED module, located above the display area and disposed on an upper surface of a portion of the planarization layer;

a drive electrode located above the sensing area and disposed on an upper surface of a portion of the planarization layer;

a pixel defining layer, covering the drive electrode and the planarization layer not covered by the drive electrode;

an insulation layer, located above the pixel defining layer; and

a sensing electrode, disposed on the insulation layer, combining with the insulation layer and the drive electrode to form a sensor.

2. The display device structure of claim 1, wherein the insulation layer is made from dielectric material.

3. The display device structure of claim 1, wherein the OLED module includes:

an anode, disposed over the planarization layer of the display area;

an OLED device layer, disposed over the anode; and

a cathode, disposed over the OLED device layer.

4. The display device structure of claim 3, wherein the drive electrode and the anode are made from same material.

5. The display device structure of claim 3, wherein the display device further comprises an index matching layer;

the index matching layer is disposed over an upper surface of the cathode.

6. The display device structure of claim 5, wherein the index matching layer is made from organic compound.

7. The display device structure of claim 1, wherein the substrate is a TFT array substrate.

8. The display device structure of claim 1, wherein the display device is an AMOLED display.

9. A method for manufacturing a display device, comprising:

providing a semiconductor substrate having a display area and a sensing area;

depositing a planarization layer above the semiconductor substrate;

forming an anode on an upper surface of the planarization layer over the display area, and forming a drive electrode on a. portion of an upper surface of the planarization layer over the sensing area;

forming an OLED device layer on an upper surface of the anode, and forming a pixel design layer on an exposed surface of the planarization layer and the drive electrode;

forming a cathode covering an upper surface of the OLED device layer, an upper surface of the pixel design layer and a side wall of the pixel design layer; and

configuring an opening on the cathode to the pixel design layer, then forming the insulation layer and the sensing electrode in the opening according to the order of bottom-up.

10. The method for manufacturing the display device of claim 9, wherein, using a same etching process to form the drive electrode and the anode.