SYSTEM FOR DISCHARGING AN AREA THAT IS SCANNED BY AN ELECTRON BEAM

• US 20160336146A1
• Filed: 05/12/2015
• Published: 11/17/2016
• Est. Priority Date: 05/12/2015
• Status: Active Grant

• Current Assignee: Applied Materials Israel Limited (Applied Materials Incorporated)
• Original Assignee: Applied Materials Israel Limited (Applied Materials Incorporated)
• Inventors: GOLDENSHTEIN, Alex
• Granted Patent: US 9,673,023 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: H01J 2237/0047 using electromagnetic radiations, e.g. UV, X-rays, light
• CPC Class Codes: H01J 2237/04 Means for controlling the discharge
• CPC Class Codes: H01J 2237/063 Electron sources
• CPC Class Codes: H01J 2237/2801 Details
• CPC Class Codes: H01J 2237/2817 Pattern inspection
• CPC Class Codes: H01J 37/026 Means for avoiding or neutralising unwanted electrical charges on tube components
• CPC Class Codes: H01J 37/073 Electron guns using field emission, photo emission, or secondary emission electron sources
• CPC Class Codes: H01J 37/226 Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence

Abstract

A method and a system for imaging an object, the system may include electron optics that may be configured to scan a first area of the object with at least one electron beam; wherein the electron optics may include a first electrode; and light optics that may be configured to illuminate at least one target of (a) the first electrode and (b) the object, thereby causing an emission of electrons between the first electrode and the object.

Claims

1. A system for imaging an object, the system comprises:

electron optics that is configured to scan a first area of the object with at least one electron beam;

wherein the electron optics comprises a first electrode; and

light optics that is configured to illuminate at least one target of (a) the first electrode and (b) the object, thereby causing an emission of electrons between the first electrode and the object.

3. The system according to claim 1 wherein the light optics that is configured to illuminate the at least one target thereby causing an emission of electrons between the first electrode and the first area.

4. The system according to claim 1, wherein the light optics is configured to illuminate both the first electrode and the object.

5. The system according to claim 1, comprising a controller that is configured to determine which target of the at least one target to illuminate by the light optics.

8. The system according to claim 1, wherein the first electrode comprises a metal mirror;

wherein the light optics is configured to illuminate the metal mirror with a beam of light; and

wherein the metal mirror is configured to direct the beam of light towards the first area.

10. The system according to claim 1, wherein the light optics is configured to illuminate the first area and the first electrode simultaneously.

11. The system according to claim 1, wherein the first area is scanned during a scan period;

and wherein the light optics is configured to illuminate the first area and the first electrode at different points in time during the scan period.

12. The system according to claim 1, comprising biasing circuits for providing a same biasing voltage to the first electrode and to the object.

14. The system according to claim 1, wherein the light optics that is configured to illuminate the at least one target thereby causing an emission of electrons between the first electrode and a second area that differs from the first area.

16. The system according to claim 1, wherein the first electrode is closer to the object than any other electrode of the electron optics.

17. The system according to claim 1, wherein the electron optics comprise a column and wherein the first electrode is spaced apart from the column.

2. (canceled)

6-7. -7. (canceled)

9. (canceled)

13. (canceled)

15. (canceled)

18. A system for imaging an object, the system comprises:

electron optics that is configured to scan a first area of the object with at least one electron beam;

wherein the electron optics comprises a first electrode; and

light optics that is configured to illuminate the first electrode thereby causing the first electrode to emit electrons towards the object when the object is more positive than the first electrode.

19. The system according to claim 18, wherein the light optics is further configured to illuminate the first area thereby causing the first area to emit electrons towards the first electrode when the first area is more negative than the first electrode.

20. The system according to claim 18, wherein the first electrode comprises a metal mirror;

wherein the light optics is configured to illuminate the metal mirror with a beam of light; and

wherein the metal mirror is configured to direct the beam of light towards the first area.

25. The system according to claim 18, comprising biasing circuits for providing different biasing voltages to the first electrode and to the object.

26. The system according to claim 18, wherein the first electrode is closer to the object than any other electrode of the electron optics.

27. The system according to claim 18, wherein the electron optics comprise a column and wherein the first electrode is spaced apart from the column.

21-24. -24. (canceled)

28. A system for imaging an object, the system comprises:

electron optics that is configured to scan a first area of the object with at least one electron beam;

wherein the electron optics comprises a first electrode; and

light optics that is configured to illuminate, with at least one light beam, (a) the first electrode, and (b) the first area, thereby causing (i) an emission of electrons from the first electrode towards the first area when the first area is positive in relation to the first electrode; and

(ii) an emission of electrons from the first area towards the first electrode when the first area is negative in relation to the first electrode.

29. The system according to claim 28 wherein the first electrode is closer to the object than any other electrode of the electron optics.

30. The system according to claim 28 wherein the electron optics comprise a column and wherein the first electrode is spaced apart from the column.

31. (canceled)