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DISPLAY SUBSTRATE, ITS MANUFACTURING METHOD AND DISPLAY DEVICE

  • US 20160336374A1
  • Filed: 04/26/2016
  • Published: 11/17/2016
  • Est. Priority Date: 05/15/2015
  • Status: Active Grant
First Claim
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1. A method for manufacturing a display substrate, comprising a step of forming a plurality of thin film transistors (TFTs), wherein the method further comprises steps of:

  • forming a lattice matching layer on a substrate so as to deposit aluminium nitride (AlN) on the lattice matching layer;

    depositing an AlN layer on the lattice matching layer by low-temperature pulse magnetron sputtering; and

    forming on the AlN layer gallium nitride (GaN) light-emitting diodes (LEDs) each including an n-type GaN layer, a multilayered quantum well structure and a p-type GaN layer and corresponding to one of the TFTs.

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