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COMPLEMENTARY BIPOLAR SRAM

  • US 20160343427A1
  • Filed: 07/07/2015
  • Published: 11/24/2016
  • Est. Priority Date: 05/20/2015
  • Status: Active Grant
First Claim
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1. A method of manufacturing a memory cell comprising:

  • forming a first set of lateral bipolar transistors on a semiconductor substrate, the first set of lateral bipolar transistors forming a first inverter device, andforming a second set of lateral bipolar transistors on the substrate, the second set of lateral bipolar transistors forming a second inverter device, wherein a first bipolar transistor of each said first set and second set is an PNP type bipolar transistor having a base terminal, an emitter terminal and a collector terminal, and a second bipolar transistor of each said first set and second set being a NPN type bipolar transistor having a base terminal, a first emitter terminal, a second emitter terminal, and a collector terminal, the first inverter device and second inverter device configured in a cross-coupled configuration to store a logic state;

    forming a first conductor layer that electrically couples the emitter terminal of said PNP type transistor of said first inverter device to said emitter terminal of said PNP type transistor of said second inverter device;

    forming a second conductor layer that electrically couples the first emitter terminal of said NPN transistor of said first inverter device to the first emitter terminal of said NPN transistor of said second inverter device; and

    forming a third conductor layer that electrically couples said second emitter terminal of said NPN bipolar transistor of said first inverter to a bit line true (BLT) conductor; and

    forming a fourth conductor layer that electrically couples said second emitter terminal of said lateral NPN bipolar transistor of said second inverter device to a bit line complement (BLC) conductor.

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