IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD FOR PRODUCING ARTICLE

• US 20160363874A1
• Filed: 06/03/2016
• Published: 12/15/2016
• Est. Priority Date: 06/10/2015
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Matsumoto, Takahiro, Kobayashi, Kenichi, Miyaharu, Takafumi, Murakami, Yosuke, Hayashi, Tatsuya
• Granted Patent: US 10,642,171 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: B29C 2059/023 Microembossing
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 9/7042 Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting non-exposure lithographic processes per se G03F7/0002
• CPC Class Codes: H01L 21/68 for positioning, orientation or alignment

Abstract

An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.

Claims

1. An imprint apparatus which forms a pattern in a region to be processed on a substrate by using a mold and an imprint material, comprising:

a substrate holding unit which attracts and holds the substrate;

a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the region to be processed;

a heating unit which gives heat to the region to be processed to deform the region to be processed;

an obtaining unit which obtains first information defined based on a difference of shapes of the region to be processed and a pattern portion of the mold, and second information about a deformation amount of the region to be processed, the second information being obtained by trying deformation of the region to be processed by the heating unit while the substrate holding unit is attracting the substrate; and

a patterning unit configured to form the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated by the generation unit, wherein

the generation unit generates the heating distribution data based on the first information and the second information which are obtained by the obtaining unit.

2. The imprint apparatus according to claim 1, wherein the first information is temporal heating distribution data temporarily generated based on the difference of the shapes, and the generation unit generates the heating distribution data by correcting the first information with a use of the second information.

3. The imprint apparatus according to claim 2, wherein the heating distribution data is data obtained by multiplying the temporal heating distribution data by a correction coefficient obtained from the second information.

4. The imprint apparatus according to claim 1, comprising a detection unit which detects a plurality of marks provided in the region to be processed in the trying deformation, wherein the obtaining unit obtains the second information based on change in positions of the marks detected by the detection unit.

5. The imprint apparatus according to claim 1, comprising

a plurality of attracting units each of which controls an attracting force of the substrate for each of a plurality of divided regions included in the substrate holding unit, and

the obtaining unit obtains a plurality of pieces of second information corresponding to different positions in the divided regions attracted by the plurality of common attracting units.

6. The imprint apparatus according to claim 1, wherein there are a plurality of regions to be processed on the substrate, and the generation unit generates, based on the same second information, the heating distribution data associated with two regions to be processed among the plurality of regions to be processed.

7. The imprint apparatus according to claim 1, wherein there are a plurality of regions to be processed on the substrate, and two regions to be processed, which are subjected to trying deformation, are at positions having different distances from a center of the substrate.

8. The imprint apparatus according to claim 1, wherein there are a plurality of regions to be processed on the substrate, and the second information is information applied to each of the plurality of regions to be processed.

9. The imprint apparatus according to claim 1, wherein the second information is information applied to each of the divided regions which are obtained by virtually dividing one region to be processed into a plurality of regions.

10. The imprint apparatus according to claim 1, wherein the heating unit has a light source for emitting light, and controls illumination of the light to apply a heat value corresponding to the heating distribution data to the region to be processed.

11. The imprint apparatus according to claim 1 forming a pattern on a plurality of substrates, wherein

the second information is information obtained when a region to be processed on a first substrate in the same lot is thermally deformed, and the second information about the first substrate is applied to a substrate different from the first substrate.

12. The imprint apparatus according to claim 1, wherein the second information is information obtained by trying deformation of a region to be processed on a standard substrate, and an operation of forming the pattern is performed for a substrate different from the standard substrate.

13. An imprint apparatus which forma a pattern in a region to be processed on a substrate by using a mold and an imprint material, comprising:

a substrate holding unit which attracts and holds the substrate;

a plurality of attracting units each of which is able to control an attracting force of the substrate for each of a plurality of divided regions included in the substrate holding unit;

a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the region to be processed;

a heating unit which gives heat to the region to be processed to deform the region to be processed;

an obtaining unit which obtains first information defined based on a difference of shapes of the region to be processed and a pattern portion of the mold, and second information about a deformation amount of the region to be processed, the second information being obtained by trying deformation of the region to be processed by the heating unit while the substrate holding unit is attracting the substrate; and

a patterning unit configured to form the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated by the generation unit, wherein

the obtaining unit obtains the second information corresponding to a plurality of different positions of the divided regions attracted by common attraction units, and

the generation unit generates the heating distribution data corresponding to the plurality of different positions based on the first information and each of the second information which are obtained by the obtaining unit.

14. An imprint method for forming a pattern in a region to be processed on a substrate by making a mold and an imprint material contact with each other and curing the imprint material, comprising:

a first obtaining step of obtaining first information defined based on a difference of shapes of the region to be processed and a pattern portion of the mold;

a step of giving heat to the region to be processed to deform the region to be processed;

a second obtaining step of obtaining second information about a deformation amount of the region to be processed when the region to be processed is deformed at the step;

a step of generating heating distribution data indicating distribution of a heat value to be applied to the region to be processed based on the first information obtained at the first obtaining step and the second information obtained at the second obtaining step; and

a step of curing the imprint material while the region to be processed is being deformed while giving heat to the region to be processed based on the heating distribution data generated at the step.

15. The imprint method according to claim 14, wherein the second obtaining step is performed after the mold and the imprint material are made contact with each other.

16. The imprint method according to claim 14, wherein the second obtaining step is performed before the mold and the imprint material are made contact with each other.

17. A method for producing an article by using an imprint apparatus which forms a pattern in a region to be processed on a substrate by using a mold and an imprint material, comprising:

a step of forming the pattern on the substrate; and

a step of processing the substrate on which the pattern is formed at the step, wherein

the imprint apparatus includes;

a substrate holding unit which attracts and holds the substrate;

a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the region to be processed;

a heating unit which gives heat to the region to be processed to deform the region to be processed;

an obtaining unit which obtains first information defined based on a difference of shapes of the region to be processed and a pattern portion of the mold, and second information about a deformation amount of the region to be processed, the second information being obtained by trying deformation of the region to be processed by the heating unit while the substrate holding unit is attracting the substrate; and

a patterning unit configured to form the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated by the generation unit, and

the generation unit generates the heating distribution data based on the first information and the second information which are obtained by the obtaining unit.