SYSTEM FOR DYNAMIC MONITORING OF A MACHINE

• US 20170030953A1
• Filed: 07/29/2016
• Published: 02/02/2017
• Est. Priority Date: 07/31/2015
• Status: Abandoned Application

• Current Assignee: BK Vibro America, Inc. (Spectris PLC)
• Original Assignee: Metrix Instrument Co., LP (Roper Technologies, Inc.)
• Inventors: Nelson, Matthew Allen, Fox, Jonathan Daniel, Ferguson, Jeremiah Robert
• Application Number:
  US15/223,093
• Publication Number:
  US 20170030953A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G05B 19/00 Programme-control systems
• CPC Class Codes: G05B 23/0221 Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods

Abstract

A monitoring system having one or more sensors configured for providing dynamic information from one or more machinery assets, wherein in the system continuously samples monitoring data under predetermined states of the machine.

Claims

1. A system for dynamic monitoring of a machine comprising:

one or more sensors configured to measure parameters on the machine,

a microcomputer configured to collect dynamic waveform data from said sensors continuously when said microcomputer detects the machine is in a transient condition, and

local memory for storing said dynamic waveform data continuously during said transient condition,

wherein said microcomputer is configured to enter or exit continuous data collection automatically based on an index calculated from a combination of one or more of said measured parameters.

2. There system of claim 1, wherein at least one of said measured parameters is selected from one of the group consisting of:

speed, AC amplitude, DC bias, and phase.

3. The system of claim 1, wherein said microcomputer is further configured to display dynamic waveform data based on said stored dynamic waveform data in a plotted form.

4. The system of claim 3, wherein said microcomputer is further configured to apply a fast Fourier transform to overlapping segments of said dynamic waveform data to produce a series of spectral plots of said data.

5. The system of claim 4, wherein said microcomputer is further configured to base an amount of overlapping on plot resolution.

6. The system of claim 5, wherein said microcomputer is further configured to automatically increase said amount of overlapping as a plot time range is zoomed in.

7. A method for continuous data sampling of a machine monitoring sensor comprising:

monitoring sensor data continuously during operation of the machine, and

starting and stopping continuous data sampling automatically based on changes in at least one machine parameter selected from the group consisting of speed, vibration amplitude, and vibration phase.

8. The method of claim 7, wherein said starting and stopping is based on changes in speed and wherein a speed change threshold is manually configurable.