MULTI-LAYER GROUND SHIELD STRUCTURE OF INTERCONNECTED ELEMENTS
First Claim
Patent Images
1. A device comprising:
- a first patterned layer of a ground shield structure, the first patterned layer including first conductive elements interconnected within the first patterned layer according to a first pattern;
a second patterned layer of the ground shield structure, the second patterned layer including second conductive elements interconnected within the second patterned layer according to a second pattern; and
a spacer between the first patterned layer and the second patterned layer.
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Abstract
A multi-layer ground shield structure of interconnected elements is disclosed. The ground shield structure may include a first patterned layer of a ground shield structure, a second patterned layer of the ground shield structure, and a spacer between the first patterned layer and the second patterned layer. The first patterned layer includes first conductive elements interconnected within the first patterned layer according to a first pattern. The second patterned layer includes second conductive elements interconnected within the second patterned layer according to a second pattern.
6 Citations
30 Claims
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1. A device comprising:
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a first patterned layer of a ground shield structure, the first patterned layer including first conductive elements interconnected within the first patterned layer according to a first pattern; a second patterned layer of the ground shield structure, the second patterned layer including second conductive elements interconnected within the second patterned layer according to a second pattern; and a spacer between the first patterned layer and the second patterned layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A computer-readable medium storing instructions that are executable by a processor to perform operations comprising:
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initiating formation of a first patterned layer of a ground shield structure, the first patterned layer including first conductive elements interconnected within the first patterned layer according to a first pattern; and initiating formation of a second patterned layer of the ground shield structure, the second patterned layer including second conductive elements interconnected within the second patterned layer according to a second pattern, wherein a spacer is between the first patterned layer and the second patterned layer. - View Dependent Claims (19, 20)
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21. A ground shield structure comprising:
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means for conducting charge, the means for conducting charge comprising a first layer of interconnected elements and a second layer of interconnected elements, the first layer of interconnected elements and the second layer of interconnected elements configured to electrically shield a first structure from an electric field associated with a second structure; and means for impeding conduction of charge, the means for impeding conduction of charge located between the first layer of interconnected elements and the second layer of interconnected elements. - View Dependent Claims (22, 23, 24)
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25. A method of forming a ground shield structure, the method comprising:
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forming a first patterned layer of the ground shield structure, the first patterned layer including first conductive elements interconnected within the first patterned layer according to a first pattern; and forming a second patterned layer of the ground shield structure, the second patterned layer including second conductive elements interconnected within the second patterned layer according to a second pattern, wherein a spacer is located between the first patterned layer and the second patterned layer. - View Dependent Claims (26, 27, 28, 29, 30)
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Specification