Damage Prevention on EUV Mask
First Claim
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1. A method, comprising:
- applying a first chemical solution and a second chemical solution to a photomask to remove contaminant particles from the photomask, wherein the photomask includes a ruthenium (Ru) layer and the second chemical solution prevents the first chemical solution from reacting with the Ru layer.
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Abstract
A method of cleaning a photomask is disclosed. The method includes mixing a first chemical solution with a second chemical solution; and discharging the mixed chemical solution through an outlet of a nozzle to a surface of the photomask on which includes a ruthenium (Ru) layer, wherein the first chemical solution is configured to dislodge contaminant particles from the surface of the photomask and the second chemical solution is configured to provide an electron to the first chemical solution.
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Citations
20 Claims
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1. A method, comprising:
applying a first chemical solution and a second chemical solution to a photomask to remove contaminant particles from the photomask, wherein the photomask includes a ruthenium (Ru) layer and the second chemical solution prevents the first chemical solution from reacting with the Ru layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of cleaning a photomask, comprising:
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mixing a first chemical solution with a second chemical solution; and discharging the mixed chemical solution through an outlet of a nozzle to a surface of the photomask on which includes a ruthenium (Ru) layer, wherein the first chemical solution is configured to dislodge contaminant particles from the surface of the photomask and the second chemical solution is configured to provide an electron to the first chemical solution. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A system for cleaning a photomask, comprising:
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a first inlet that is configured to receive a first chemical solution; a second inlet that is coupled to the first inlet and configured to receive a second chemical solution; and an outlet that is coupled to the first and second inlets and configured to discharge a mixed chemical solution that includes the first and second chemical solutions to a surface of the photomask, wherein the surface of the photomask includes a ruthenium (Ru) layer, wherein the second chemical solution is configured to provide an electron to the first chemical solution thereby preventing an oxidized Ru layer being formed on the surface of the photomask. - View Dependent Claims (18, 19, 20)
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Specification