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Damage Prevention on EUV Mask

  • US 20170052443A1
  • Filed: 08/21/2015
  • Published: 02/23/2017
  • Est. Priority Date: 08/21/2015
  • Status: Active Grant
First Claim
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1. A method, comprising:

  • applying a first chemical solution and a second chemical solution to a photomask to remove contaminant particles from the photomask, wherein the photomask includes a ruthenium (Ru) layer and the second chemical solution prevents the first chemical solution from reacting with the Ru layer.

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