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METHOD FOR FORMING PATTERNS AND METHOD FOR MANUFACTURING MAGNETIC MEMORY DEVICE USING THE SAME

  • US 20170062709A1
  • Filed: 06/13/2016
  • Published: 03/02/2017
  • Est. Priority Date: 09/02/2015
  • Status: Active Grant
First Claim
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1. A method for forming a pattern, the method comprising:

  • forming an etch target layer on a substrate;

    patterning the etch target layer to form patterns; and

    performing a pre-oxidation trim process a plurality of times,the pre-oxidation trim process including;

    performing an oxidation process to form an insulating layer on a sidewall of each of the patterns; and

    performing a sputter etch process to remove at least a portion of the insulating layer.

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