CHARGED-PARTICLE-BEAM ANALYSIS DEVICE AND ANALYSIS METHOD

• US 20170067838A1
• Filed: 05/30/2014
• Published: 03/09/2017
• Est. Priority Date: 05/30/2014
• Status: Active Grant

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: KOGUCHI, Masanari, ANAN, Yoshihiro
• Granted Patent: US 9,752,997 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: G01N 23/225 using electron or ion
• CPC Class Codes: G01N 23/2252 Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]

Abstract

To provide a charged particle beam analyzer enabling an efficient and high-sensitivity analysis of a microscopic light element contained in a heavy metal sample, the charged particle beam analyzer equipped with a WDX spectrometer includes a storage unit 126 having stored therein a correlation database between average atomic numbers and WDX background intensity values obtained with use of a plurality of standard samples and a WDX background processing means 146 including a means 147 for calculating an average atomic number for a sample 129 and a means for eliminating a WDX background intensity value derived from the average atomic number for the sample 129 and the correlation database from a WDX spectrum for the sample 129.

Claims

1. A charged particle beam analyzer comprising a charged particle beam optical system, a sample stage for mounting a sample thereon, an X-ray spectrometer, a control unit, and an operation unit, and controlling the charged particle beam optical system by means of the control unit to irradiate the sample with a charged particle beam, detecting an X-ray generated from the sample by means of the X-ray spectrometer, and analyzing the sample with use of detected information by means of the operation unit, wherein

the X-ray spectrometer is a wavelength dispersive X-ray spectrometer (WDX spectrometer), and

the operation unit includes:

a storage unit having stored therein a correlation database between a plurality of average atomic numbers and WDX background intensity values obtained with use of a plurality of standard samples; and

a WDX background processing means including an average atomic number calculation means for calculating an average atomic number for the sample and a background elimination means for eliminating a WDX background intensity value derived from the average atomic number for the sample calculated by the average atomic number calculation means and the correlation database stored in the storage unit from a WDX spectrum for the sample obtained with use of the X-ray spectrometer.

2. The charged particle beam analyzer according to claim 1, wherein the average atomic number calculation means uses information detected in an energy dispersive X-ray spectrometer (EDX spectrometer).

3. The charged particle beam analyzer according to claim 1, wherein the average atomic number calculation means uses information detected in a backscattered electron detector.

4. The charged particle beam analyzer according to claim 2, wherein the average atomic number calculated by the average atomic number calculation means is displayed on any of display units included in the charged particle beam analyzer.

5. The charged particle beam analyzer according to claim 1, wherein

each of the plurality of standard samples contains a light element having a known concentration, and

the storage unit has stored therein correlation data between the average atomic numbers and WDX light element X-ray peak intensity values for correcting a light element X-ray amount to be absorbed in the sample.

6. The charged particle beam analyzer according to claim 5, wherein an X-ray absorption rate or an X-ray absorption amount of the light element in relation to the average atomic number obtained from the average atomic number and the WDX X-ray peak detected are displayed on any of the display units included in the charged particle beam analyzer.

7. The charged particle beam analyzer according to claim 1, further comprising a sample surface cleaning means for cleaning a surface of the sample.

8. The charged particle beam analyzer according to claim 7, wherein the sample surface cleaning means includes an ion or plasma irradiation mechanism.

9. The charged particle beam analyzer according to claim 7, wherein the sample surface cleaning means includes a sample heating mechanism.

10. A charged particle beam analyzer comprising a charged particle beam optical system, a sample stage for mounting a sample thereon, an X-ray spectrometer, a control unit, and an operation unit, and controlling the charged particle beam optical system by means of the control unit to irradiate the sample with a charged particle beam, detecting an X-ray generated from the sample by means of the X-ray spectrometer, and performing map evaluation for the sample with use of detected information, wherein

the X-ray spectrometer is a wavelength dispersive X-ray spectrometer (WDX spectrometer), and

the operation unit includes:

a storage unit having stored therein a correlation database between a plurality of average atomic numbers and WDX background intensity values obtained with use of a plurality of standard samples;

a WDX background processing means including an average atomic number calculation means for calculating an average atomic number map with use of X-ray energy corresponding to a specific light element on a surface of the sample and a background elimination means for eliminating a WDX background intensity map derived from the average atomic number map for the surface of the sample calculated by the average atomic number calculation means and the correlation database stored in the storage unit from a WDX spectrum map for the sample obtained with use of the X-ray spectrometer; and

an image display unit for displaying the WDX background intensity map derived from the correlation database stored in the storage unit.

11. The charged particle beam analyzer according to claim 10, wherein the image display unit displays a map image into which the WDX background intensity map derived from the average atomic number map for the surface of the sample calculated by the average atomic number calculation means and the correlation database stored in the storage unit is eliminated from the WDX spectrum map for the sample obtained with use of the X-ray spectrometer.

12. An analysis method comprising:

a first step of creating a correlation database between a plurality of average atomic numbers and WDX background intensity values with use of a plurality of standard samples and storing the correlation database in a storage unit; and

a second step of calculating an average atomic number for an evaluated sample and eliminating a WDX background intensity value derived from the calculated average atomic number for the evaluated sample and the correlation database stored in the storage unit from a WDX spectrum for the sample obtained with use of a wavelength dispersive X-ray spectrometer.

13. The analysis method according to claim 12, wherein the average atomic number is obtained with use of an energy dispersive X-ray spectrometer.

14. The analysis method according to claim 12, wherein the average atomic number is obtained with use of a backscattered electron detector.

15. The analysis method according to claim 12, wherein

each of the plurality of standard samples contains a light element having a known concentration, and

the storage unit has stored therein correlation data between the average atomic numbers and WDX light element X-ray peak intensity values for correcting a light element X-ray amount to be absorbed in the sample.