NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
First Claim
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1. A nonvolatile memory device comprising:
- a pipe gate electrode layer formed over a substrate;
a plurality of conductive layers stacked over the pipe gate electrode layer;
source lines formed over the plurality of conductive layers; and
first slits passing through the pipe gate electrode layer to divide the pipe gate electrode layer into a plurality of pipe gate electrodes,wherein the first slits overlap with the source lines,wherein second slits pass through the conductive layers to divide the conductive layers into a plurality of memory blocks, andwherein the second slits do not overlap with the first slits.
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Abstract
A nonvolatile memory device includes a pipe gate electrode layer formed over a substrate; a plurality of conductive layers stacked over the pipe gate electrode layer; source lines formed over an uppermost one of the conductive layers; first slits passing through the pipe gate electrode layer at positions overlapping with the source lines, and dividing the pipe gate electrode layer into a plurality of pipe gate electrodes, and second slits passing through the conductive layers at positions different from the first slits, and dividing the conductive layers into a plurality of memory blocks.
25 Citations
23 Claims
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1. A nonvolatile memory device comprising:
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a pipe gate electrode layer formed over a substrate; a plurality of conductive layers stacked over the pipe gate electrode layer; source lines formed over the plurality of conductive layers; and first slits passing through the pipe gate electrode layer to divide the pipe gate electrode layer into a plurality of pipe gate electrodes, wherein the first slits overlap with the source lines, wherein second slits pass through the conductive layers to divide the conductive layers into a plurality of memory blocks, and wherein the second slits do not overlap with the first slits. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for manufacturing a nonvolatile memory device, comprising:
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forming a pipe gate electrode layer over a substrate; etching the pipe gate electrode layer to form first slits which divide the pipe gate electrode layer into a plurality of pipe gate electrodes; forming a first dielectric layer filling the first slits; forming a stack by alternately stacking a plurality of first material layers and a plurality of second material layers over the pipe gate electrodes and the first dielectric layer; etching the first and second material layers by using the pipe gate electrodes as an etch stop layer to form second slits, wherein the second slits divide the stack into a plurality of memory blocks, wherein the second slits do not overlap with the first slits; forming a second dielectric layer filling the second slits; and forming source lines over the divided stack and over the second dielectric layer wherein the source lines overlap with the first slits. - View Dependent Claims (14, 15, 18, 19, 20, 21, 22, 23)
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16. The method according to clam 13,
wherein the first material layers comprise interlayer dielectric layers, and the second material layers comprise sacrificial layers.
Specification