TRANSPARENT DISPLAY DEVICES AND METHOD OF MANUFACTURING THE SAME

• US 20170069871A1
• Filed: 07/20/2016
• Published: 03/09/2017
• Est. Priority Date: 09/04/2015
• Status: Abandoned Application

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: YIM, Sang-Hoon, KIM, Dong-Chan, KIM, Eung-Do, SEO, Dong-Kyu, LEE, Ji-Hye, IM, Da-Hea, CHU, Chang-Woong, HAN, Won-Suk, KIM, Won-Jong, CHO, Yoon-Hyeung
• Application Number:
  US15/215,319
• Publication Number:
  US 20170069871A1
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: H10K 2102/351 Thickness
• CPC Class Codes: H10K 50/15 Hole transporting layers
• CPC Class Codes: H10K 50/828 Transparent cathodes, e.g. comprising thin metal layers
• CPC Class Codes: H10K 50/84 Passivation; Containers; Encapsulations
• CPC Class Codes: H10K 50/844 Encapsulations
• CPC Class Codes: H10K 50/858 comprising refractive means, e.g. lenses
• CPC Class Codes: H10K 59/1201 Manufacture or treatment
• CPC Class Codes: H10K 59/121 characterised by the geometry or disposition of pixel elements
• CPC Class Codes: H10K 59/122 Pixel-defining structures or layers, e.g. banks
• CPC Class Codes: H10K 59/123 Connection of the pixel electrodes to the thin film transistors [TFT]
• CPC Class Codes: H10K 59/124 Insulating layers formed between TFT elements and OLED elements
• CPC Class Codes: H10K 71/80 using temporary substrates

Abstract

A transparent display device includes a substrate having a pixel area and a transmission area, a pixel circuit in the pixel area of the substrate, an insulation structure covering the pixel circuit on the substrate, a first electrode in the pixel area of the substrate and extending at least partially through the insulation structure to be electrically connected to the pixel circuit, a display layer on the first electrode, a second electrode facing the first electrode with respect to the display layer, and a capping layer on the second electrode. The capping layer continuously extends into the pixel area and the transmission area. The capping layer has a thickness in a range from about 350 Å to about 700 Å.

Claims

1. A transparent display device, comprising:

a substrate having a pixel area and a transmission area;

a pixel circuit in the pixel area of the substrate;

an insulation structure covering the pixel circuit on the substrate;

a first electrode in the pixel area of the substrate and extending at least partially through the insulation structure to be electrically connected to the pixel circuit;

a display layer on the first electrode;

a second electrode facing the first electrode with respect to the display layer; and

a capping layer on the second electrode, the capping layer extending continuously into the pixel area and the transmission area, the capping layer having a thickness in a range from about 350 Å

to about 700 Å

.

2. The transparent display device of claim 1, wherein the second electrode continuously extends into the pixel area and the transmission area.

3. The transparent display device of claim 1, wherein the second electrode includes silver (Ag), magnesium (Mg), or an alloy of Ag and Mg.

4. The transparent display device of claim 3, wherein the second electrode has a thickness in a range from about 30 Å

to about 120 Å

.

5. The transparent display device of claim 1, wherein the display layer includes an organic light emitting layer,

the first electrode and the second electrode serve as an anode and a cathode, respectively, and

the capping layer includes a hole transport-type organic material.

6. The transparent display device of claim 1, further comprising a pixel defining layer on the insulation structure,

wherein a transmitting window exposing the insulation structure at the transmission area is defined by the transmitting window.

7. The transparent display device of claim 1, wherein the pixel circuit includes an active pattern, a gate electrode, a source electrode and a drain electrode on the substrate,

wherein the insulation structure includes:

a gate insulation layer covering the active pattern on the substrate;

an insulating interlayer covering the gate electrode on the gate insulation layer; and

a via insulation layer covering the source electrode and the drain electrode on the insulating interlayer,

wherein the source electrode and the drain electrode extend through the insulating interlayer and the gate insulation layer to be in contact with the active pattern, and the first electrode extends through the via insulation layer to be in contact with the drain electrode.

8. The transparent display device of claim 7, wherein the via insulation layer is selectively formed at the pixel area, and a transmitting window is defined at the transmission area by a sidewall of the via insulation layer and a top surface of the insulating interlayer.

9. The transparent display device of claim 8, wherein the second electrode and the capping layer are formed along a surface of the transmitting window at the transmission area.

10. The transparent display device of claim 7, wherein the via insulation layer and the insulating interlayer are selectively disposed in the pixel area, and a transmitting window is defined at the transmission area by a sidewall of the via insulation layer and a top surface of the gate insulation layer.

11. The transparent display device of claim 1, further comprising a filling layer and an encapsulation substrate sequentially disposed on the capping layer.

12. The transparent display device of claim 11, wherein the capping layer includes an organic material having a refractive index of at least about 1.85.

13. The transparent display device of claim 11, wherein the filling layer includes an organic material having a refractive index in a range from about 1.4 to about 1.6.

14. A transparent display device, comprising:

a substrate having a pixel area and a transmission area;

a pixel circuit at the pixel area of the substrate;

an insulation structure covering the pixel circuit on the substrate;

a first electrode at the pixel area of the substrate and extending at least partially through the insulation structure to be electrically connected to the pixel circuit;

a display layer on the first electrode;

a second electrode facing the first electrode with respect to the display layer; and

a capping layer on the second electrode, the capping layer continuously extending into the pixel area and the transmission area, the capping layer having different thicknesses at the pixel area and the transmission area.

15. The transparent display device of claim 14, wherein the capping layer includes:

a first portion covering the pixel area and having a thickness in a range from about 700 Å

to about 900 Å

; and

a second portion covering the transmission area and having a thickness in a range from about 350 Å

to about 700 Å

.

16. The transparent display device of claim 15, wherein the second electrode continuously extends into the pixel area and the transmission area.

17. The transparent display device of claim 15, wherein the second electrode includes Ag, Mg, or an alloy of Ag and Mg, and the second electrode has a thickness in a range from about 30 Å

to about 120 Å

.

18. The transparent display device of claim 14, wherein a thickness of the insulation structure at the transmission area is less than a thickness of the insulation structure at the pixel area, and a transmitting window is defined by a surface of the insulation structure at the transmission area,

wherein the second electrode and the capping layer are formed along a surface of the transmitting window at the transmission area.

19. A method of manufacturing a transparent display device, comprising:

preparing a substrate having a pixel area and a transmission area;

forming a pixel circuit on the substrate;

forming an insulation structure on the substrate, the insulation structure at least partially covering the pixel circuit;

forming a first electrode on a portion of the insulation structure at the pixel area, the first electrode being electrically connected to the pixel circuit;

forming a display layer on the first electrode;

forming a second electrode on the display layer, the second electrode facing the first electrode;

determining a maximum transmittance thickness and a maximum luminescent efficiency thickness of a capping layer under a thickness condition of the second electrode; and

forming the capping layer on the second electrode, the capping layer having the maximum luminescent efficiency thickness at the pixel area and the maximum transmittance thickness at the transmittance area.

20. The method of claim 19, wherein the maximum luminescent efficiency thickness corresponds to a minimum transmittance thickness.