×

Plasma System, Chuck and Method of Making a Semiconductor Device

  • US 20170076962A1
  • Filed: 11/22/2016
  • Published: 03/16/2017
  • Est. Priority Date: 07/06/2012
  • Status: Active Grant
First Claim
Patent Images

1. A chuck comprising:

  • a first conductive region configured to be capacitively coupled to a first RF power signal;

    a second conductive region configured to be capacitively coupled to a second RF power signal; and

    an insulation region that electrically insulates the first conductive region from the second conductive region.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×