Plasma System, Chuck and Method of Making a Semiconductor Device
First Claim
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1. A chuck comprising:
- a first conductive region configured to be capacitively coupled to a first RF power signal;
a second conductive region configured to be capacitively coupled to a second RF power signal; and
an insulation region that electrically insulates the first conductive region from the second conductive region.
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Abstract
A chuck, a system including a chuck and a method for making a semiconductor device are disclosed. In one embodiment the chuck includes a first conductive region configured to be capacitively coupled to a first RF power generator, a second conductive region configured to be capacitively coupled to a second RF power generator and an insulation region that electrically insulates the first conductive region from the second conductive region.
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Citations
20 Claims
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1. A chuck comprising:
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a first conductive region configured to be capacitively coupled to a first RF power signal; a second conductive region configured to be capacitively coupled to a second RF power signal; and an insulation region that electrically insulates the first conductive region from the second conductive region. - View Dependent Claims (2, 3, 4)
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5. A system comprising:
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a plasma chamber; a first electrode located in the plasma chamber; and a second electrode located in the plasma chamber and configured to receive a workpiece, wherein the second electrode comprises a first conductive region and a second conductive region that is electrically insulated from the first conductive region, wherein the first conductive region is configured to receive a first RF power and the second conductive region is configured to receive a second RF power. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12, 13)
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14. A system comprising:
a chuck comprising a first conductive region configured to be capacitively coupled to a first RF power signal, a second conductive region configured to be capacitively coupled to a second RF power signal, wherein the first conductive region is disk shaped, and the second conductive region is a concentric ring, an insulation region that electrically insulates the first conductive region from the second conductive region, a third conductive region configured to be capacitively coupled to a third RF power signal, and a second insulated region that electrically insulates the second conductive region from the third conductive region. - View Dependent Claims (15, 16, 17, 18, 19, 20)
Specification