TOPOGRAPHY SIMULATION OF ETCHING AND/OR DEPOSITION ON A PHYSICAL STRUCTURE
First Claim
1. A non-transitory computer-readable storage medium storing instructions that, when executed by a computer, cause the computer to perform a method for topography simulation of etching and/or deposition on a physical structure, the method comprising:
- initializing a three-dimensional (3D) voxel grid data structure that represents a volume containing the physical structure, wherein each voxel in the 3D voxel grid data structure stores a value that represents an amount of material in a 3D region corresponding to the voxel; and
for each particle emitted by a Monte-Carlo particle emission model, performing a set of operations to determine a topographical modification caused by the particle, wherein the set of operations comprises;
calculating a flux contribution of the particle at a location where the particle impacts a surface of the physical structure, wherein an impacted voxel in the 3D voxel grid data structure corresponds to the location;
evaluating surface reactions at the location based on the flux contribution to obtain a value modification, wherein the value modification corresponds to an amount of material that is etched or deposited at the location by the particle; and
using the value modification to update values stored in the impacted voxel and potentially other voxels in proximity to the impacted voxel.
1 Assignment
0 Petitions
Accused Products
Abstract
Systems and techniques are described for topography simulation of etching and/or deposition on a physical structure. The structural information can be represented using a three-dimensional (3D) voxel grid data structure. For each particle emitted by a Monte-Carlo particle emission model, a topographical modification caused by the particle can be determined by (1) calculating fluxes, (2) evaluating surface reactions, and (3) modifying the physical structure. The effect of the etching and/or deposition on a physical structure can be displayed by rendering the 3D voxel grid data structure.
18 Citations
18 Claims
-
1. A non-transitory computer-readable storage medium storing instructions that, when executed by a computer, cause the computer to perform a method for topography simulation of etching and/or deposition on a physical structure, the method comprising:
-
initializing a three-dimensional (3D) voxel grid data structure that represents a volume containing the physical structure, wherein each voxel in the 3D voxel grid data structure stores a value that represents an amount of material in a 3D region corresponding to the voxel; and for each particle emitted by a Monte-Carlo particle emission model, performing a set of operations to determine a topographical modification caused by the particle, wherein the set of operations comprises; calculating a flux contribution of the particle at a location where the particle impacts a surface of the physical structure, wherein an impacted voxel in the 3D voxel grid data structure corresponds to the location; evaluating surface reactions at the location based on the flux contribution to obtain a value modification, wherein the value modification corresponds to an amount of material that is etched or deposited at the location by the particle; and using the value modification to update values stored in the impacted voxel and potentially other voxels in proximity to the impacted voxel. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. An integrated circuit (IC) design system, comprising:
-
a processor; and a non-transitory computer-readable storage medium storing instructions that, when executed by the processor, cause the IC design system to perform a method for topography simulation of etching and/or deposition on a physical structure, the method comprising; initializing a three-dimensional (3D) voxel grid data structure that represents a volume containing the physical structure, wherein each voxel in the 3D voxel grid data structure stores a value that represents an amount of material in a 3D region corresponding to the voxel; and for each particle emitted by a Monte-Carlo particle emission model, performing a set of operations to determine a topographical modification caused by the particle, wherein the set of operations comprises; calculating a flux contribution of the particle at a location where the particle impacts a surface of the physical structure, wherein an impacted voxel in the 3D voxel grid data structure corresponds to the location; evaluating surface reactions at the location based on the flux contribution to obtain a value modification, wherein the value modification corresponds to an amount of material that is etched or deposited at the location by the particle; and using the value modification to update values stored in the impacted voxel and potentially other voxels in proximity to the impacted voxel. - View Dependent Claims (8, 9, 10, 11, 12)
-
-
13. A method for topography simulation of etching and/or deposition on a physical structure, the method comprising:
-
initializing a three-dimensional (3D) voxel grid data structure that represents a volume containing the physical structure, wherein each voxel in the 3D voxel grid data structure stores a value that represents an amount of material in a 3D region corresponding to the voxel; and for each particle emitted by a Monte-Carlo particle emission model, performing a set of operations to determine a topographical modification caused by the particle, wherein the set of operations comprises; calculating a flux contribution of the particle at a location where the particle impacts a surface of the physical structure, wherein an impacted voxel in the 3D voxel grid data structure corresponds to the location; evaluating surface reactions at the location based on the flux contribution to obtain a value modification, wherein the value modification corresponds to an amount of material that is etched or deposited at the location by the particle; and using the value modification to update values stored in the impacted voxel and potentially other voxels in proximity to the impacted voxel. - View Dependent Claims (14, 15, 16, 17, 18)
-
Specification