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TOPOGRAPHY SIMULATION OF ETCHING AND/OR DEPOSITION ON A PHYSICAL STRUCTURE

  • US 20170147724A1
  • Filed: 11/23/2016
  • Published: 05/25/2017
  • Est. Priority Date: 11/25/2015
  • Status: Active Grant
First Claim
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1. A non-transitory computer-readable storage medium storing instructions that, when executed by a computer, cause the computer to perform a method for topography simulation of etching and/or deposition on a physical structure, the method comprising:

  • initializing a three-dimensional (3D) voxel grid data structure that represents a volume containing the physical structure, wherein each voxel in the 3D voxel grid data structure stores a value that represents an amount of material in a 3D region corresponding to the voxel; and

    for each particle emitted by a Monte-Carlo particle emission model, performing a set of operations to determine a topographical modification caused by the particle, wherein the set of operations comprises;

    calculating a flux contribution of the particle at a location where the particle impacts a surface of the physical structure, wherein an impacted voxel in the 3D voxel grid data structure corresponds to the location;

    evaluating surface reactions at the location based on the flux contribution to obtain a value modification, wherein the value modification corresponds to an amount of material that is etched or deposited at the location by the particle; and

    using the value modification to update values stored in the impacted voxel and potentially other voxels in proximity to the impacted voxel.

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