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BINARY PATTERNING FOR THREE-DIMENSIONAL MEMORY FORMATION

  • US 20170147730A1
  • Filed: 11/23/2015
  • Published: 05/25/2017
  • Est. Priority Date: 11/23/2015
  • Status: Abandoned Application
First Claim
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1. A method for designing a patterning process for a three-dimensional (3D) memory, the method comprising:

  • defining a target 3D structure of the 3D memory, to be applied in a periodic structure of layers on a substrate;

    converting the target 3D structure into a sequence of multiple steps, each step specifying a respective pattern to be removed and a respective number of the layers to be removed from the periodic structure under the respective pattern; and

    sending the sequence of steps to one or more manufacturing tools.

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