APPARATUS FOR PROCESSING SUBSTRATE

• US 20170175264A1
• Filed: 11/15/2016
• Published: 06/22/2017
• Est. Priority Date: 12/21/2015
• Status: Active Grant

• Current Assignee: NPS Corporation
• Original Assignee: NPS Corporation
• Inventors: NAM, Won Sik, YEON, Kang Heum, SONG, Dae Seok
• Granted Patent: US 10,643,868 B2
• Time in Patent Office: Days
• CPC Class Codes: H01L 21/67115 mainly by radiation
• CPC Class Codes: H01L 21/67757 vertical transfer of a batch of workpieces

Abstract

Represent invent ion relates to a substrate processing apparatus, comprising, a chamber comprising a base frame formed to open at least a part of faces extending in vertical direction and horizontal direction, a main heat source provided in a row with isolation on an opened face of the base frame, and a block which is connected to the opened face of the base frame and forms a space in the base frame in which the substrate is processed; and a substrate support portion which is provided in the chamber and supports the substrate, and by integrating the chamber and the heat source, the size of the chamber itself is reduced, the space can be used efficiently with reduced installation space, and facilities cost can be saved.

Claims

1. A substrate processing apparatus, comprising:

a chamber comprising a base frame formed to open at least a part of faces extending in the vertical direction and the horizontal direction, a main heat source provided in a row with isolation on an opened face of the base frame, and a block which is connected to the opened face of the base frame and forms a space in the base frame in which the substrate is processed; and

a substrate support portion which is provided in the chamber and supports the substrate.

2. A substrate processing apparatus according to claim 1, the base frame comprising,

an upper frame with a shape of polygon frame,

a lower frame provided to be formed with a shape corresponding to the upper frame and to be isolated in the vertical direction against the upper frame, and

a side frame with a shape of tetragonal frame connecting each of both end portions of the upper frame and the lower frame.

3. A substrate processing apparatus according to claim 2, the block comprising,

an upper block covering the upper frame,

a lower block covering the lower frame, and

a plurality of side block connecting an edge of the upper block and an edge of the lower block each other and covering the side frame.

4. A substrate processing apparatus according to claim 3, wherein,

the upper block is connected to an upper portion of the upper frame in an attachable and detachable manner, and

a gas supply unit for supplying cool down gas and substrate processing gas into the chamber is provided at an upper portion of the upper block.

5. A substrate processing apparatus according to claim 3, wherein,

the lower block is connected to a bottom portion of the lower frame, and

a through hole is formed at a center portion of the lower frame to connect to a gate which supports the substrate support portion and is opened and closed when the substrate is imported and exported.

6. A substrate processing apparatus according to claim 3, wherein,

the main heat source is provided to cut across inside of the side frame.

7. A substrate processing apparatus according to claim 6, wherein,

the main heat source is provided at a different height each other to a heat source provided on a neighboring side frame.

8. A substrate processing apparatus according to claim 7, comprising,

an auxiliary heat source unit provided between the block and the substrate support portion.

9. A substrate processing apparatus according to claim 8, the auxiliary heat source unit comprising,

an auxiliary heat source which is arranged in a direction intersecting with the main heat source and encloses an outer side of the substrate support portion.

10. A substrate processing apparatus according to claim 8, the substrate support portion comprising,

a substrate support stanchion supporting the substrate,

a stand on one side of which the substrate support stanchion is received safe,

a support shaft which is provided as passing through the gate and supports the stand in the chamber being connected to the other side of the stand, and

an actuator which is provided outside of the chamber and rotates the support shaft.

11. A substrate processing apparatus according to claim 10, the substrate support stanchion comprising,

an upper plate on which an inflow hole for gas to be flowed in is formed,

a lower plate which is arranged as being isolated from the upper plate and on which an outflow hole for gas to be discharged is formed,

a body comprising a rod which connects the upper plate and the lower plate each other, and

a fixing member which is connected to the upper plate and the lower plate and fixes the substrate to enclose the body.

12. A substrate processing apparatus according to claim 11, the fixing member comprising,

a first fixing member which is arranged in a row to the rod and both ends of which is fixed to an outer side of the upper plate and the lower plate each, and

a second fixing member which is provided in a row with isolation to the first fixing member and both ends of which is fixed to an outer side of the upper plate and the lower plate each.

13. A substrate processing apparatus according to claim 12, the first fixing member comprising,

a pair of fixing rod, and

an isolation member provided between the fixing rods,

wherein a gap being formed between the fixing rods into which one side of the substrate is inserted.

14. A substrate processing apparatus according to claim 13, the second fixing member comprising,

to a fixing rod in which a fixing hole is formed with isolation along the longitudinal direction, and

a fixing pin which is inserted into the fixing hole and fixes the other side of the substrate.

15. A substrate processing apparatus according to claim 14, wherein,

the second fixing member is connected to be able to move along at least a part of a circumferential direction of the upper plate and the lower plate.

16. A substrate processing apparatus according to claim 10, the substrate support stanchion comprising,

an upper plate on which an inflow hole for gas to be flowed in is formed,

a lower plate which is arranged as being isolated from the upper plate and on which an outflow hole for gas to be discharged is formed,

a body comprising a rod which connects the upper plate and the lower plate each other and on which a slit is formed for one side of the substrate to be inserted along longitudinal direction, and

a fixing member which is connected to the upper plate and the lower plate and fixing the other side of the substrate to enclose the rod.

17. A substrate processing apparatus according to claim 16, wherein,

the rod is connected to either one of the upper plate and the lower plate to be able to be rotated.

18. A substrate processing apparatus according to claim 17, the fixing member comprising,

a fixing rod on which a fixing hole isolated along the longitudinal direction is formed, and

a fixing pin which is inserted into the fixing hole and fixes the other side of the substrate.

19. A substrate processing apparatus according to claim 18, wherein,

the fixing member is connected to be able to move along at least a part of a circumferential direction of the upper plate and the lower plate.

20. A substrate processing apparatus according to claim 19, wherein,

a discharge hole for gas to be discharged is formed on the stand.