GAS DIFFUSER HAVING GROOVED HOLLOW CATHODES

• US 20170178867A1
• Filed: 11/30/2016
• Published: 06/22/2017
• Est. Priority Date: 12/18/2015
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: WHITE, John M., KUDELA, Jozef, TINER, Robin L., LAU, Allen K., FURUTA, Gaku, KURITA, Shinichi, STERLING, William Norman, LEE, Dongsuh, ANWAR, Suhail
• Application Number:
  US15/365,497
• Publication Number:
  US 20170178867A1
• Time in Patent Office: Days
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/5096 Flat-bed apparatus
• CPC Class Codes: H01J 2237/3321 CVD [Chemical Vapor Deposition]
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow
• CPC Class Codes: H01J 37/32532 Electrodes

Abstract

In one embodiment, a diffuser for a deposition chamber includes a plate having edge regions and a center region, and plurality of gas passages comprising an upstream bore and an orifice hole fluidly coupled to the upstream bore that are formed between an upstream side and a downstream side of the plate, and a plurality of grooves surrounding the gas passages, wherein a depth of the grooves varies from the edge regions to the center region of the plate.

Claims

1. A diffuser for a deposition chamber, comprising:

a plate having edge regions and a center region, and plurality of gas passages comprising an upstream bore and an orifice hole fluidly coupled to the upstream bore that are formed between an upstream side and a downstream side of the plate, and a plurality of grooves surrounding the gas passages, wherein a depth of the grooves varies from the edge regions to the center region of the plate.

2. The diffuser of claim 1, wherein the depth of the grooves increases from the center region to the edge region of the plate.

3. The diffuser of claim 1, wherein a width of the grooves varies from the edge regions to the center region of the plate.

4. The diffuser of claim 1, wherein a portion of the orifice holes are fluidly coupled to one or more grooves of the plurality of grooves.

5. The diffuser of claim 1, wherein the plurality of gas passages comprise a groove pattern on the downstream side of the plate.

6. The diffuser of claim 5, wherein the groove pattern comprises grooves that are fluidly coupled to the orifice holes.

7. The diffuser of claim 5, wherein the groove pattern comprises diagonally oriented grooves that at least partially intersect.

8. The diffuser of claim 5, wherein the groove pattern comprises an oval or circular pattern of substantially concentric grooves.

9. The diffuser of claim 5, wherein the groove pattern comprises a rectangular pattern.

10. The diffuser of claim 5, wherein the groove pattern comprises a plurality of radially oriented grooves extending from a geometric center of the plate.

11. A diffuser for a deposition chamber, comprising:

a plate having edge regions and a center region, and plurality of gas passages comprising an upstream bore and an orifice hole fluidly coupled to the upstream bore that are formed between an upstream side and a downstream side of the plate, and a plurality of hollow cathode cavities surrounding the gas passages, wherein each of the hollow cathode cavities comprise a groove and a width of the grooves increases from the center region to the edge regions of the plate.

12. The diffuser of claim 11, wherein a depth of the grooves varies from the edge regions to the center region of the plate.

13. The diffuser of claim 11, wherein a portion of the orifice holes are fluidly coupled to one or more grooves.

14. The diffuser of claim 11, wherein the plurality of gas passages comprise a groove pattern on the downstream side of the plate.

15. The diffuser of claim 14, wherein the groove pattern comprises grooves that are fluidly coupled to the orifice holes.

16. The diffuser of claim 14, wherein the groove pattern comprises diagonally oriented grooves that at least partially intersect.

17. The diffuser of claim 14, wherein the groove pattern comprises an oval or circular pattern of substantially concentric grooves.

18. The diffuser of claim 14, wherein the groove pattern comprises a rectangular pattern.

19. The diffuser of claim 14, wherein the groove pattern comprises a plurality of radially oriented grooves extending from a geometric center of the plate.

20. An electrode for a deposition chamber, comprising:

a plate having edge regions and a center region, and plurality of gas passages comprising an upstream bore and an orifice hole fluidly coupled to the upstream bore that are formed between an upstream side and a downstream side of the plate, and a plurality of hollow cathode cavities formed in a groove pattern on a downstream side of the plate and surrounding the gas passages, wherein the groove pattern comprises a plurality of grooves having a size that varies from the center region to the edge regions of the plate.