POLISHING PADS AND SYSTEMS AND METHODS OF MAKING AND USING THE SAME
First Claim
1. ) A polishing pad comprising a polishing layer having a working surface and a second surface opposite the working surface;
- wherein the working surface includes a plurality of precisely shaped pores, a plurality of precisely shaped asperities and a land region;
wherein each pore has a pore opening, each asperity has an asperity base, and a plurality of the asperity bases are substantially coplanar relative to at least one adjacent pore opening;
wherein the depth of the plurality of precisely shaped pores is less than the thickness of the land region adjacent to each precisely shaped pore and the thickness of the land region is less than about 5 mm; and
wherein the polishing layer comprises a polymer.
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Accused Products
Abstract
The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes a plurality of precisely shaped pores, a plurality of precisely shaped asperities and a land region. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.
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Citations
43 Claims
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1. ) A polishing pad comprising a polishing layer having a working surface and a second surface opposite the working surface;
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wherein the working surface includes a plurality of precisely shaped pores, a plurality of precisely shaped asperities and a land region; wherein each pore has a pore opening, each asperity has an asperity base, and a plurality of the asperity bases are substantially coplanar relative to at least one adjacent pore opening; wherein the depth of the plurality of precisely shaped pores is less than the thickness of the land region adjacent to each precisely shaped pore and the thickness of the land region is less than about 5 mm; and wherein the polishing layer comprises a polymer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43)
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Specification