PATTERN-FORMING METHOD

• US 20170184960A1
• Filed: 03/16/2017
• Published: 06/29/2017
• Est. Priority Date: 09/17/2014
• Status: Active Grant

• Current Assignee: JSR Corporation
• Original Assignee: JSR Corporation
• Inventors: NARUOKA, Takehiko, FUJISAWA, Tomohisa, SHIRATANI, Motohiro, NAKAGAWA, Hisashi
• Granted Patent: US 10,520,815 B2
• Time in Patent Office: Days
• CPC Class Codes: G03F 7/0042 with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists G03F7/075 takes precedence
• CPC Class Codes: G03F 7/0045 with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
• CPC Class Codes: G03F 7/038 Macromolecular compounds which are rendered insoluble or differentially wettable G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021
• CPC Class Codes: G03F 7/162 Coating on a rotating support, e.g. using a whirler or a spinner
• CPC Class Codes: G03F 7/168 Finishing the coated layer, e.g. drying, baking, soaking
• CPC Class Codes: G03F 7/2004 characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
• CPC Class Codes: G03F 7/2006 using coherent light; using polarised light
• CPC Class Codes: G03F 7/2037 Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
• CPC Class Codes: G03F 7/322 Aqueous alkaline compositions
• CPC Class Codes: H01L 21/0274 Photolithographic processes

Abstract

A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

Claims

1. A pattern-forming method comprising:

applying a radiation-sensitive composition on a substrate to provide a film on the substrate;

exposing the film; and

developing the film exposed,

wherein;

the radiation-sensitive composition comprises a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof; and

a content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

2. The pattern-forming method according to claim 1, wherein the metal compound having a hydrolyzable group comprises a compound represented by formula (1):

L_aMX_b 

 

(1)

wherein in the formula (1),

M represents a transition metal atom,

L represents a ligand, and a is 1 or 2, wherein in a case where a is 2, a plurality of Ls are identical or different, and

X represents a hydrolyzable group selected from a halogen atom, an alkoxy group and a carboxylate group, and b is an integer of 2 to 6, wherein in a case where b is no less than 2, a plurality of Xs are identical or different, wherein

the ligand represented by L does not fall under definition of X.

3. The pattern-forming method according to claim 2, wherein L represents a monocarboxylic acid having no less than 6 carbon atoms, a hydroxy acid ester, a β

-diketone, a β

-ketoester, a β

-dicarboxylic acid ester, a hydrocarbon having a it bond, a phosphine, or a combination thereof.

4. The pattern-forming method according to claim 2, wherein the carboxylate group represented by X is a formate group or an alkylcarbonyloxy group having no greater than 5 carbon atoms.

5. The pattern-forming method according to claim 1, wherein the developing is carried out by using an alkaline solution to form a negative tone pattern.

6. The pattern-forming method according to claim 1, wherein the exposing is carried out by irradiation with an extreme ultraviolet ray or an electron beam.