PATTERN-FORMING METHOD

• US 20170184961A1
• Filed: 03/16/2017
• Published: 06/29/2017
• Est. Priority Date: 09/17/2014
• Status: Active Grant

• Current Assignee: JSR Corporation
• Original Assignee: JSR Corporation
• Inventors: SHIRATANI, Motohiro, NAKAGAWA, Hisashi, NARUOKA, Takehiko
• Granted Patent: US 10,725,376 B2
• Time in Patent Office: Days
• CPC Class Codes: G03F 7/0042 with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists G03F7/075 takes precedence
• CPC Class Codes: G03F 7/0044 involving an interaction between the metallic and non-metallic component, e.g. photodope systems
• CPC Class Codes: G03F 7/0045 with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
• CPC Class Codes: G03F 7/038 Macromolecular compounds which are rendered insoluble or differentially wettable G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021
• CPC Class Codes: G03F 7/162 Coating on a rotating support, e.g. using a whirler or a spinner
• CPC Class Codes: G03F 7/168 Finishing the coated layer, e.g. drying, baking, soaking
• CPC Class Codes: G03F 7/2004 characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
• CPC Class Codes: G03F 7/2037 Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
• CPC Class Codes: G03F 7/322 Aqueous alkaline compositions
• CPC Class Codes: G03F 7/325 Non-aqueous compositions

Abstract

A pattern-forming method includes applying a radiation-sensitive composition comprising a complex on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The complex includes: a metal-containing component that is a transition metal compound having a hydrolyzable group, a hydrolysis product of the transition metal compound having a hydrolyzable group, a hydrolytic condensation product of the transition metal compound having a hydrolyzable group, or a combination thereof; and an organic compound represented by formula (1). In the formula (1), R¹ represents an organic group having a valency of n, n being an integer of 1 to 4. In a case where n is 1, X represents —COOH. In a case where n is 2 to 4, X represents —OH, —COOH, —NCO, —NHR^a, —COOR^A or —CO—C(R^L)₂—CO—R^A.

R¹X)_n  (1)

Claims

1. A pattern-forming method comprising:

applying a radiation-sensitive composition comprising a complex on a substrate to provide a film on the substrate;

exposing the film; and

developing the film exposed,

wherein the complex is a reaction product from a mixture of;

a metal-containing component that is a transition metal compound having a hydrolyzable group, a hydrolysis product of the transition metal compound having a hydrolyzable group, a hydrolytic condensation product of the transition metal compound having a hydrolyzable group, or a combination thereof; and

an organic compound represented by formula (1);

R¹

X)_n 

 

(1)

wherein in the formula (1), R¹ represents an organic group having a valency of n, n being an integer of 1 to 4, wherein;

in a case where n is 1, X represents —

COOH;

in a case where n is 2 to 4, X represents —

OH, —

COOH, —

NCO, —

NHR^a, —

COOR^A or —

CO—

C(R^L)₂—

CO—

R^A,

R^a representing a hydrogen atom or a monovalent organic group,

R^A each independently representing a monovalent organic group, and

R^L each independently representing a hydrogen atom or a monovalent organic group; and

in a case where n is no less than 2, a plurality of Xs are identical or different.

2. The pattern-forming method according to claim 1, wherein the metal-containing component is a metal alkoxide that is neither hydrolyzed nor hydrolytically condensed.

3. The pattern-forming method according to claim 1, wherein in the formula (1), X represents —

OH, and n is 2 to 4.

4. The pattern-forming method according to claim 1, wherein in the formula (1), X represents —

COOH, and n is 1.

5. The pattern-forming method according to claim 1, wherein the mixture further comprises a β

-diketone, a β

-ketoester, a β

-dicarboxylic acid ester, or a combination thereof.

6. The pattern-forming method according to claim 1, wherein the radiation-sensitive composition further comprises a radiation-sensitive acid generating agent.

7. The pattern-forming method according to claim 1, wherein the developing is carried out by using an alkaline solution to form a negative tone pattern.

8. The pattern-forming method according to claim 1, wherein the developing is carried out by using an organic solvent to form a negative tone pattern.

9. The pattern-forming method according to claim 1, wherein the exposing is carried out by irradiation with an extreme ultraviolet ray or an electron beam.