COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
First Claim
1. A compound for forming an organic film shown by the formula (1A),
R—
- (—
X)m1
(1A)wherein R represents a single bond or an organic group having 1 to 50 carbon atoms;
X represents a group shown by the formula (1B); and
ml represents an integer satisfying 2≦
m1≦
10,
1 Assignment
0 Petitions
Accused Products
Abstract
A compound for forming an organic film shown by the formula (1A),
R—(—X)m1 (1A)
wherein R represents a single bond or an organic group having 1 to 50 carbon atoms; X represents a group shown by formula (1B); and ml represents an integer satisfying 2≦m1≦10,
wherein X2 represents a divalent organic group having 1 to 10 carbon atoms; n1 represents 0 or 1; n2 represents 1 or 2; X3 represents a group shown by the formula (1C); and n5 represents 0, 1, or 2,
wherein R10 represents a hydrogen atom or a saturated or unsaturated hydrocarbon group having 1 to 10 carbon atoms, wherein a hydrogen atom of the benzene ring in formula (1C) may be substituted with a methyl group or methoxy group. This compound for forming an organic film can provide organic film composition having good dry etching resistance, heat resistance to 400° C. or higher, high filling and planarizing properties.
-
Citations
21 Claims
-
1. A compound for forming an organic film shown by the formula (1A),
R—- (—
X)m1
(1A)wherein R represents a single bond or an organic group having 1 to 50 carbon atoms;
X represents a group shown by the formula (1B); and
ml represents an integer satisfying 2≦
m1≦
10, - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
- (—
Specification