METHOD OF MAKING A SEMICONDUCTOR DEVICE FORMED BY THERMAL ANNEALING
First Claim
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1. A method comprising:
- structuring a semiconductor region to form a structured surface of the semiconductor region;
disposing a dopant in the semiconductor region;
activating the dopant at least partially by irradiating the structured surface at least partially with electromagnetic radiation having at least one discrete wavelength to heat the semiconductor region at least partially; and
forming a doped region on at least one of over or in the semiconductor region at a side opposite the dopant, wherein the doped region comprises a doping type different to the dopant to form a power semiconductor circuit element comprising the dopant and the doped region.
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Abstract
According to various embodiments, a method may include: structuring a semiconductor region to form a structured surface of the semiconductor region; disposing a dopant in the semiconductor region; and activating the dopant at least partially by irradiating the structured surface at least partially with electromagnetic radiation having at least one discrete wavelength to heat the semiconductor region at least partially.
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Citations
24 Claims
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1. A method comprising:
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structuring a semiconductor region to form a structured surface of the semiconductor region; disposing a dopant in the semiconductor region; activating the dopant at least partially by irradiating the structured surface at least partially with electromagnetic radiation having at least one discrete wavelength to heat the semiconductor region at least partially; and forming a doped region on at least one of over or in the semiconductor region at a side opposite the dopant, wherein the doped region comprises a doping type different to the dopant to form a power semiconductor circuit element comprising the dopant and the doped region. - View Dependent Claims (2, 3, 4, 5, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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6. (canceled)
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20. A method comprising:
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structuring a semiconductor region to form a structured surface of the semiconductor region at a first side of the semiconductor region; disposing a dopant at least one of over or in the semiconductor region at the first side of the semiconductor region; and activating the dopant at least partially by irradiating the structured surface at least partially with electromagnetic radiation to at least a portion of the semiconductor region at the first side of the semiconductor region; and forming a doped region on at least one of over or in the semiconductor region at a second side of the semiconductor region opposite the first side, wherein the doped region comprises a doping type different to the dopant to form a power semiconductor circuit element comprising the dopant and the doped region. - View Dependent Claims (21, 22, 23)
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24. A semiconductor device, comprising:
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a semiconductor region comprising a structured surface and an activated dopant; wherein the activated dopant is disposed adjacent to the structured surface; wherein the structured surface comprises at least one of a plurality of rounded protrusions, or a plurality of rounded recesses.
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Specification