METAL WIRE GRID POLARIZATION PLATE AND MANUFACTURING METHOD THEREOF, DISPLAY PANEL AND DISPLAY DEVICE

• US 20170205550A1
• Filed: 08/23/2016
• Published: 07/20/2017
• Est. Priority Date: 01/15/2016
• Status: Active Grant

• Current Assignee: BOE Technology Group Co., Ltd.
• Original Assignee: BOE Technology Group Co., Ltd.
• Inventors: Yang, Yafeng, Zhu, Ming, Liu, Zhen, Yao, Jikai
• Granted Patent: US 10,459,137 B2
• Time in Patent Office: Days
• CPC Class Codes: G02B 5/003 Light absorbing elements
• CPC Class Codes: G02B 5/3058 comprising electrically conductive elements, e.g. wire grids, conductive particles
• CPC Class Codes: G02F 1/133528 Polarisers
• CPC Class Codes: G02F 1/133548 Wire-grid polarisers

Abstract

A metal wire grid polarization plate and a manufacturing method thereof, a display panel and a display device are provided. The metal wire grid polarization plate includes a substrate, a light absorption wire grid and a metal wire grid. The light absorption wire grid is disposed on a side of the substrate, and the metal wire grid covers the light absorption wire grid.

Claims

1. A metal wire grid polarization plate, comprising:

a substrate, a light absorption wire grid and a metal wire grid,

wherein the light absorption wire grid is disposed on a side of the substrate, and the metal wire grid covers the light absorption wire grid.

2. The metal wire grid polarization plate according to claim 1, wherein the light absorption wire grid absorbs light irradiating from the other side of the substrate and having a vibration direction not parallel to a direction of the metal wire grid.

3. The metal wire grid polarization plate according to claim 1, wherein the light absorption wire grid comprises lines which are disposed at equal interval and parallel to each other, and the metal wire grid comprises metal lines which are disposed at equal interval and parallel to each other, and the lines of the light absorption wire grid and the metal lines of the metal wire grid correspond to each other one by one.

4. The metal wire grid polarization plate according to claim 3, wherein a width of each line of the light absorption wire grid is equal to a width of each metal line of the metal wire grid.

5. The metal wire grid polarization plate according to claim 1, wherein the light absorption wire grid is made of copper oxide or chromium oxide.

6. The metal wire grid polarization plate according to claim 1, wherein the metal wire grid is made of aluminum, silver, platinum, gold or a metal compound.

7. The metal wire grid polarization plate according to claim 1, wherein the substrate is made of glass, silicon or resin.

16. A liquid crystal display panel, comprising the metal wire grid polarization plate according to claim 1.

17. The liquid crystal display panel according to claim 16, further comprising:

an array substrate and an opposite substrate which are disposed to face each other and a liquid crystal layer disposed between the array substrate and the opposite substrate, wherein the metal wire grid polarization plate is disposed between the opposite substrate and the liquid crystal layer, and the light absorption wire grid of the metal wire grid polarization plate is provided to be closer to the opposite substrate than the metal wire grid.

18. A display device, comprising the liquid crystal display panel according to claim 16.

8. A manufacturing method of a metal wire grid polarization plate, comprising:

forming a light absorption layer on a side of a substrate;

forming a metal layer on the light absorption layer; and

patterning the metal layer and the light absorption layer to form a metal wire grid and a light absorption wire grid.

9. The manufacturing method of the metal wire grid polarization plate according to claim 8, wherein forming the light absorption layer on the side of the substrate comprises:

depositing copper or chromium on the substrate;

oxidizing the copper or the chromium to form the light absorption layer.

10. The manufacturing method of the metal wire grid polarization plate according to claim 9, wherein depositing the copper or the chromium on the substrate comprises:

depositing the copper or the chromium on the substrate through a magnetron sputtering method.

11. The manufacturing method of the metal wire grid polarization plate according to claim 9, wherein oxidizing the copper or the chromium comprises:

oxidizing the copper or the chromium on the substrate by using plasma.

12. The manufacturing method of the metal wire grid polarization plate according to claim 11, wherein the plasma is oxygen plasma.

13. The manufacturing method of the metal wire grid polarization plate according to claim 8, wherein patterning the metal layer and the light absorption layer to form the metal wire grid and the light absorption wire grid comprises:

forming a photoresist on the metal layer;

patterning the photoresist to form a photoresist wire grid;

etching the metal layer and the light absorption layer not covered by the photoresist wire grid to form the metal wire grid and the light absorption wire grid; and

stripping off the photoresist wire grid to form the metal wire grid polarization plate.

14. The manufacturing method of the metal wire grid polarization plate according to claim 13, wherein patterning the photoresist to form the photoresist wire grid comprises:

patterning the photoresist by a nano imprinting method to form the photoresist wire grid.

15. The manufacturing method of the metal wire grid polarization plate according to claim 13, wherein etching the metal layer and the light absorption layer not covered by the photoresist wire grid comprises:

employing the photoresist wire grid as a mask to etch the metal layer and the light absorption layer which are not covered by the photoresist wire grid by using an electron beam.