RPS DEFECT REDUCTION BY CYCLIC CLEAN INDUCED RPS COOLING
First Claim
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1. A method of cleaning a remote plasma source, comprising:
- supplying a first cycle of one or more first cleaning gases to a remote plasma source; and
supplying a second cycle of one or more second cleaning gases to the remote plasma source.
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Abstract
A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.
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Citations
20 Claims
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1. A method of cleaning a remote plasma source, comprising:
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supplying a first cycle of one or more first cleaning gases to a remote plasma source; and supplying a second cycle of one or more second cleaning gases to the remote plasma source. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method of cleaning a remote plasma source, comprising:
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supplying a first cycle of one or more first cleaning gases to a remote plasma source; supplying a second cycle of one or more second cleaning gases to the remote plasma source, wherein an interior surface of the remote plasma source has a temperature between about 40°
C. and about 150°
C. during the first cycle and the second cycle; andsupplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source. - View Dependent Claims (19, 20)
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Specification