PROCESS FOR THE REMOVAL OF CHROMIUM CONTAMINANTS FROM RUTHENIUM SPUTTERING TARGET SUBSTRATES
First Claim
1. A method for the removal of chromium contaminants on a ruthenium sputtering target used in plasma vapor deposition including the steps ofsubjecting the ruthenium sputtering target to grit abrasion followed by an organic solvent cleaning to result in a pre-cleaned target,subjecting the pre-cleaned target to an electric field in an acidic bath including a surfactant, followed by subsequent water and air rinse.
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Abstract
The present invention provides a process for the removal of chromium contaminants on a spent ruthenium sputtering target used in Plasma Vapor Deposition by the steps of grit abrasion, organic solvent cleaning, and being subjected to an electric field in an acidic bath including a surfactant, and followed by subsequent water and air rinse and further grit abrasion. Removal of the contaminants is verified by spectroscopy.
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Citations
18 Claims
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1. A method for the removal of chromium contaminants on a ruthenium sputtering target used in plasma vapor deposition including the steps of
subjecting the ruthenium sputtering target to grit abrasion followed by an organic solvent cleaning to result in a pre-cleaned target, subjecting the pre-cleaned target to an electric field in an acidic bath including a surfactant, followed by subsequent water and air rinse.
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16. A method for the removal of chromium contaminants on a ruthenium substrate including the steps of
subjecting the ruthenium substrate to grit abrasion using 120 to 180 grit aluminum oxide followed by an organic solvent cleaning to result in a pre-cleaned substrate having a matt finish, and the organic solvent a comprising C1-6 alcohol or ketone, subjecting the pre-cleaned substrate to an electric field at 50-150 volts in an acidic bath at a pH of 1-4 and including a surfactant, followed by subsequent water and air rinse; - and subjecting the substrate to second grit abrasion using 120 to 180 grit aluminum oxide, following the water and air rinse.
- View Dependent Claims (17, 18)
Specification