IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD WITH MEASURING DEVICE

• US 20170235238A1
• Filed: 05/03/2017
• Published: 08/17/2017
• Est. Priority Date: 06/09/2004
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: SHIRAISHI, Kenichi
• Application Number:
  US15/585,664
• Publication Number:
  US 20170235238A1
• Time in Patent Office: Days
• CPC Class Codes: G03B 27/42 for automatic sequential copying of the same original G03B27/34, G03B27/53 take precedence
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Abstract

An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area. The measuring device includes a resistivity meter to obtain information on a specific resistance value of the immersion liquid.

Claims

1. An exposure apparatus comprising:

a projection system;

a liquid supply system having a liquid temperature regulator, which provides immersion liquid;

a nozzle member which receives the immersion liquid from the liquid supply system and which has a supply port for supplying the immersion liquid and a collection port for collecting the supplied immersion liquid, liquid supply via the supply port and liquid collection via the collection port being performed to form a liquid immersion area under the projection system and the nozzle member having an opening through which exposure light is projected; and

a measuring device that measures at least one of a property and a composition of the immersion liquid, the measuring device having a resistivity meter to obtain information on a specific resistance value of the immersion liquid,

wherein a substrate is exposed through the liquid immersion area which covers a portion of an upper surface of the substrate, and

wherein the immersion liquid to be supplied via the supply port is carbon dioxide water.

2. The exposure apparatus according to claim 1, further comprising a substrate stage having a holder on which the substrate is held, wherein the substrate stage has a stage upper surface arranged such that the stage upper surface and the upper surface of the substrate held are substantially in a plane.

3. The exposure apparatus according to claim 2, wherein the substrate stage is provided with a light measuring device on which the liquid immersion area is formed to receive light from the projection system via the liquid immersion area by the light measuring device.