LIGHT EMITTING DEVICE WITH TRANSPARENT CONDUCTIVE GROUP-III NITRIDE LAYER
First Claim
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1. A device comprising:
- a light-emitting semiconductor structure operable to emit light and comprising a first layer, which is p-type and composed of a nitride of at least one group-III element, and a second layer, which is n-type and composed of a nitride of at least one group-III element; and
a transparent, current spreading layer of a nitride composed of at least one group-III element, which is transparent to light emitted from the light-emitting semiconductor structure and of sufficiently high electrical conductivity to provide lateral spreading of injection current for the light-emitting semiconductor structure within the transparent, current spreading layer.
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Abstract
A group III-nitride semiconductor device comprises a light emitting semiconductor structure comprising a p-type layer and an n-type layer operable as a light emitting diode or laser. On top of the p-type layer there is arranged an n+ or n++-type layer of a group III-nitride, which is transparent to the light emitted from the underlying semiconductor structure and of sufficiently high electrical conductivity to provide lateral spreading of injection current for the light-emitting semiconductor structure.
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20 Claims
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1. A device comprising:
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a light-emitting semiconductor structure operable to emit light and comprising a first layer, which is p-type and composed of a nitride of at least one group-III element, and a second layer, which is n-type and composed of a nitride of at least one group-III element; and a transparent, current spreading layer of a nitride composed of at least one group-III element, which is transparent to light emitted from the light-emitting semiconductor structure and of sufficiently high electrical conductivity to provide lateral spreading of injection current for the light-emitting semiconductor structure within the transparent, current spreading layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for manufacturing a device, the method comprising:
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producing a light-emitting semiconductor structure operable to emit light by depositing a first layer, which is p-type and composed of a nitride of at least one group-III element, and depositing a second layer, which is n-type and composed of a nitride of at least one group-III element; and depositing a transparent, current spreading layer, which is n-type and composed of a nitride of at least one group-Ill element, the transparent, current spreading layer being configured to be transparent to light emitted from the light-emitting semiconductor structure and of sufficiently high electrical conductivity to provide lateral spreading of injection current for the light-emitting semiconductor structure within the transparent, current spreading layer. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification